Approximating the Fermi Level PositionIn order to determine the Fermi level position of our devices, we first measured the resistance vs.applied gate voltage dependence of the graphene sheet that contained the nanoresonators, as shown in Fig. S1. From these measurements we were able to determine the charge neutral point (CNP) for each device, which corresponds to applied gate voltage that aligns the Fermi level of the graphene with the Dirac point, leading to a peak in the resistance curve. Once the CNP was known, we used a simple capacitor model in order to approximate the position of E F for a given gate voltage. For a 285nm SiO 2 layer, this relationship is given by ܧ| ி | ൌ 0.0319ඥ|ܸ ே െ ܸ ீ |.For most devices, V G could be varied from -100V to +200V without causing electric breakdown of the SiO 2 layer.We found that our as-prepared samples were hole doped, and that the degree of hole doping was dependent on the etchant we used to remove the copper foil that the graphene was grown on. As shown in Fig. S1, when an Ammonium Persulfate (APS) solution (2% by wt.) was used as the etchant, the CNP typically occurred near V G =50V. In contrast, when an Iron(III) Chloride (FeCl) solution (40% by wt.) was used as the etchant, the CNP occurred at much higher gate biases, typically with V G near +180V. This intrinsic hole doping allowed us to electrostatically shift the E F from 0 to -0.52 eV.The above analysis applies to the bare graphene surface. However, it has been recently observed by Thongrattanasiri, et al 1 that the simple capacitance model typically used to estimate the Fermi level position of graphene devices may change when the graphene is patterned in a nanoribbon geometry. In particular, it was predicted by those authors that the Fermi level position can deviate strongly near the nanoribbon edges, and that this deviation can affect the plasmonic