Plasma synthesis of metallic and composite thin films with atomically mixed substrate bonding

Brown, Ian; Anders, André; Anders, S.; Dickinson, M.R.; Ivanov, I.; MacGill, R.A.; Yao, Xiang; Yu, K. M.

doi:10.1016/0168-583x(93)90782-2

Cited by 85 publications

(24 citation statements)

References 16 publications

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“…Brown and coworkers [59,60] phased metal plasma production and bias pulses, giving periods of lower energy (no or The high bias, and related high ion energy, lead to substrate-film mixing at the interface, which was originally attributed to be the main reason for superior adhesion [62], especially for materials that can form strong chemical bonds. For example, energetic condensation of carbon on silicon leads to a thin silicon carbide ("glue")…”

Section: Graded Layers Ultrathin Films Multilayers Nanolaminatesmentioning

confidence: 99%

Metal plasmas for the fabrication of nanostructures

Anders¹

2007

J. Phys. D: Appl. Phys.

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A review is provided covering metal plasma production, the energetic condensation of metal plasmas, and the formation of nanostructures using such plasmas. Plasma production techniques include pulsed laser ablation, filtered cathodic arcs, and various forms of ionized physical vapor deposition, namely magnetron sputtering with ionization of sputtered atoms in radio frequency discharges, self-sputtering, and high power impulse magnetron sputtering. The discussion of energetic condensation focuses on the control of kinetic energy by biasing and also includes considerations of the potential energy and the processes occurring at subplantation and implantation. In the final section on nanostructures, two different approaches are discussed. In the top-down approach, the primary nanostructures are lithographically produced and metal plasma is used to coat or fill trenches and vias. Additionally, multilayers with nanosize periods (nanolaminates) can be produced. In the bottom-up approach, thermodynamic forces are used to fabricate nanocomposites and nanoporous materials by decomposition and dealloying.

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Section: Graded Layers Ultrathin Films Multilayers Nanolaminatesmentioning

confidence: 99%

Metal plasmas for the fabrication of nanostructures

Anders¹

2007

J. Phys. D: Appl. Phys.

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“…The process was based on grading the ceramic-metal coating interface via energetic condensation of arc plasma ions. Unfortunately, the specific ''recipes'' remained unpublished and only some general description was given [182].…”

Section: Metallization For Specialty Brazingmentioning

confidence: 99%

Some Applications of Cathodic Arc Coatings

Anders

2008

Cathodic Arcs

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“…This hybrid principle was first proposed by Brown and coworkers using a single-material cathodic arc plasma source. 17,18 Using a dual-cathode source, the possibilities of metal plasma immersion ion implantation and deposition (MePIIID 1 ) are extended by choosing arbitrary combinations ("recipes") of materials and energy by selectively energizing the arc plasma pulses in desired phases with bias pulses.…”

Section: A Ion Etching and Implantation Versus Depositionmentioning

confidence: 99%

Filtered cathodic arc deposition with ion-species-selective bias

Anders

Pasaja

Sansongsiri

2007

Review of Scientific Instruments

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A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier such as to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis metal-doped diamond-like carbon films, where the bias was applied and adjusted when the carbon plasma was condensing, and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by too-energetic metal ions can be avoided while the sp 3 /sp 2 ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias. The principle can be extended to multiple-material plasma sources and complex materials.

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Plasma synthesis of metallic and composite thin films with atomically mixed substrate bonding

Cited by 85 publications

References 16 publications

Metal plasmas for the fabrication of nanostructures

Metal plasmas for the fabrication of nanostructures

Some Applications of Cathodic Arc Coatings

Filtered cathodic arc deposition with ion-species-selective bias

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