Plasma-Polymerized Carbon Disulfide Thin-Film Rechargeable Batteries

Abstract

This paper discusses the results on deposition conditions, rates of polymerization, and properties of carbon disulfide films prepared by two techniques, viz., plasma polymerization and argon-plasma-assisted polymerization of carbon disulfide. A higher rate of polymerization and sulfur content was obtained for carbon disulfide films prepared by the plasma-polymerization technique. A Li/LiClO4 propylene carbonate/PPCS cell was assembled using lithium foil, 2 M LiClO4/PC electrolyte with polyolefin separator, and PPCS deposited on Pt foil. The electrode area was 1.3 cm2. The cell cycled reversibly between 1 and 3 V and retained its capacity (5 mA h/g) well over 12 cycles.

Characterization of low dielectric constant polyaniline thin film synthesized by ac plasma polymerization technique

“…In recent years, the dielectric and electronic properties of polymeric and organic thin films have received a great deal of interest because of their importance in many advanced applications such as organic LEDs, sensors, rechargeable batteries, electroluminescent devices and as intermetallic dielectrics in ICs [1][2][3][4][5]. One of the fastest growing areas in the field of polymer thin film deposition are plasma assisted methods.…”

Experimental Analysis of Characterization of Aerosol Sediments Formed by Plasma-Induced CS2 Destruction Processes

“…for those obtained in the electrical discharge or glow discharge (Van Drumpt, 1972;Asano, 1983). The results obtained by infrared and electron spectroscopy for chemical analysis (ESCA) also revealed that the presence of CϭS and C-S moieties were for the preparation of thin-film solid-state batteries by using plasma-polymerization of CS 2 (Sadhir and Schoch, 1996).…”

“…It was found that the S 2P peak could be fitted to three line shapes with binding energies at 161.7, 164.1, and 168.8 eV. These different binding energy peaks are fitted to S 2Ϫ at 161.7 eV, S 0 at 164.1 eV and S 4ϩ at 168.8 eV, respectively (Brown and Terman, 1984;Tsukamoto and Takahashi, 1986;Fornasiero et al, 1994;Fgoli et al, 1996;Sadhir and Schoch, 1996;Carley et al, 2000). In this case, the total area of the S 2P peak was 5.8% of S 2Ϫ , 89.2% of S 0 , and 5.0% of S 4ϩ .…”

“…In previous studies, high pressure polymerization (Whalley, 1960;Chan and Jonscher, 1969), photolysis (de Sorgo et al, 1965), chemical polymerization (Tsukamoto and Takahashi, 1986), laser-induced polymerization (Ernst and Hoffman, 1979;Matsuzaki et al, 1992;Desai et al, 1995), and plasma polymerization (Hirotsu, 1981;Asano, 1983;Sadhir and Schoch, 1996;Denisov et al, 1997) of CS 2 usually led to the formation of dark brown to black depositions or polymers. The structures of the polymers have been described as linearor crosslinked (CS 2 ) n for the 45 kilobar products or thermal decomposition of photopolymerization products (Whalley, 1960;Chan and Jonscher, 1969;Colman et al, 1996), as (CS) n for plasmalysis (Denisov et al, 1997), laser-induced aerosol (Ernst and Hoffman, 1979;Desai et al, 1995) or combustion (Cullis, 1972), and as [CS(S) m ] n (m ϭ 0, 1, 2 .…”

Cold Plasma – A Promising Tool for the Development of Electrochemical Cells

“…0.5-1 μm) deposited on Pt foil showed satisfactory electrochemical activity in cells vs. Li/Li+. Compared to poly(carbon disulfide) prepared by conventional chemical means, cells having the pp-CS 2 improved cycle life because the plasma polymerized material is more crosslinked and does not depolymerize as readily (Sadhir & Schoch, 1996).…”