Plasma polymerization and deposition of glycidyl methacrylate on Si(100) surface for adhesion improvement with polyimide

Abstract

Thin polymer films were deposited on Si(100) surfaces by plasma polymerization of glycidyl methacrylate (GMA) under different glow discharge conditions. The FT‐IR, X‐ray photoelectron spectroscopy (XPS), and amine treatment results suggested that the epoxide functional groups of the deposited films had been preserved to various extents, depending on the plasma deposition conditions. The use of a low radio frequency power (∼ 5 W) and a relatively high system pressure (100–400 Pa) readily resulted in the deposition of thin films having nearly the same composition of the epoxide functional groups as that of the GMA homopolymer. The plasma‐polymerized GMA (PP‐GMA) thin films deposited on the Ar plasma‐pretreated Si(100) surfaces were retained to a large extent after acetone extraction, suggesting the presence of covalent bonding between the PP‐GMA layer and the Si surface. Thermal imidization of the poly(amic acid) precursor of polyimide on the GMA plasma‐polymerized Si(100) surface resulted in a strongly adhered polyimide film. The adhesion results further suggested that the GMA polymer had been grafted on the Si(100) surface and the epoxide functional groups had undergone reactive interaction (curing) with the carboxylic and amine groups of the poly(amic acid) during thermal imidization. Copyright © 2001 John Wiley & Sons, Ltd.

Initiated and Oxidative Chemical Vapor Deposition of Polymeric Thin Films: iCVD and oCVD

“…The broadened peaks in Figure 4b also demonstrates that plasma enhanced CVD (PECVD) of GMA, employing 127 mW/cm 2 for radio frequency excitation, in the absence of any initiator, results in very little retention of the sensitive epoxide functionality, consistent with previous reports. [53][54][55] The ability of iCVD to avoid unwanted side reactions, such as destruction of pendent groups, is a result of the relative simplicity of the low energy pathways for the iCVD reaction mechanism relative to that for PECVD ( Figure 5). The retention of functional groups is a key feature of iCVD that will be emphasized in the subsequent discussions of applications in this article.…”

New Monomer Based on Eugenol Methacrylate, Synthesis, Polymerization and Copolymerization with Methyl Methacrylate–Characterization and Thermal Properties

“…This is because these materials are endowed with the well-balanced properties of epoxy and methacrylate, and the epoxy functional groups can improve the performance of the resulting materials through crosslinking reactions. Based on this principle, poly(glycidyl methacrylate) (PGMA) is utilized the most in this family, and has been the subject of a large number of applications; these are used in surface modification [1][2][3][4][5][6], adhesives [7,8], compatibilizers for polymer blends [9][10][11][12], electrolytes [13] and biochemistry [14][15][16]. In addition, PGMA has been used as the base material for the design of various compounds via copolymerization or grafting [17][18][19][20][21][22][23][24].…”

Kopolimerisasi Grafting Campuran N-Isopropilakrilamida dan Glisidil Metakrilat pada Film Polietilen yang Diinduksi oleh Sinar Ultraviolet

“…Pada penelitian sebelumnya, film polietilen (PE) telah dimodifikasi dengan memasukkan berbagai fungsionalitas tunggal seperti kepekaan terhadap suhu (Irwan et al, 2002a;Irwan 2006b), pH (Irwan et al, 2002b), sifat katalis (Aoyama et al, 2001;Hashimoto et al, 2003), amobilisasi enzym (Aoyama et al, 2001) dan penukar ion (Irwan, 2006a) (Leie et al, 1997). Disamping itu, glisidil metakrilat adalah suatu monomer yang sangat menarik disebabkan memiliki dua sifat fungsional yang unik yakni ikatan rangkap yang reaktif terhadap pembentukan radikal bebas, dan gugus epoksi yang dapat bereaksi cepat dengan sejumlah gugus fungsi lain seperti karboksil (Zou et al, 2001), hidroksil (Kim et al, 1991), posfat (Pesneau et al, 2004), amina (Yu & Ryu 1999) dan lainnya (Choi et al, 2003 (Zou et al, 2001), hidroksil (Kim et al, 1991), posfat (Pesneau et al, 2004), amina (Yu & Ryu 1999) dan lainnya (Choi et al, 2003…”