2018 IEEE Micro Electro Mechanical Systems (MEMS) 2018
DOI: 10.1109/memsys.2018.8346588
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Plasma ion-beam 3D printing: A novel method for rapid fabrication of customized MEMS sensors

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Cited by 4 publications
(5 citation statements)
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“…Capacitive MEMS vibration sensors were produced by a high-current plasma focused ion beam (FIB) technique and compared with sensors prepared by the common lithography process. While the resonance frequency differed by only 4%, the fabrication time could be reduced by approximately 80% [72].…”
Section: Physical Sensorsmentioning
confidence: 97%
“…Capacitive MEMS vibration sensors were produced by a high-current plasma focused ion beam (FIB) technique and compared with sensors prepared by the common lithography process. While the resonance frequency differed by only 4%, the fabrication time could be reduced by approximately 80% [72].…”
Section: Physical Sensorsmentioning
confidence: 97%
“…An improved variant of this process, with a high impact on the MEMS scale, also called focused ion beam (FIB), includes the gas supply through a nozzle close to the focused ion beam source [149]. The same ion beam is used for etching (subtractive operation) and depositing (additive operation) the material.…”
Section: Other Processes 61 Electron/ion Beam Induced Deposition (E/ibid)mentioning
confidence: 99%
“…The group of Watanabe et al [ 46 ] reported an innovative method for 3D printing based on a plasma ion beam. They used a high-current plasma focused ion beam (FIB) to generate customized microelectromechanical systems (MEMS).…”
Section: Innovative Am Technologiesmentioning
confidence: 99%