Plasma generation and plasma sources

Abstract

This paper reviews the most commonly used methods for the generation of plasmas with special emphasis on non-thermal, low-temperature plasmas for technological applications. We also discuss various technical realizations of plasma sources for selected applications. This paper is further limited to the discussion of plasma generation methods that employ electric fields. The various plasmas described include dc glow discharges, either operated continuously (CW) or pulsed, capacitively and inductively coupled rf discharges, helicon discharges, and microwave discharges. Various examples of technical realizations of plasmas in closed structures (cavities), in open structures (surfatron, planar plasma source), and in magnetic fields (electron cyclotron resonance sources) are discussed in detail. Finally, we mention dielectric barrier discharges as convenient sources of non-thermal plasmas at high pressures (up to atmospheric pressure) and beam-produced plasmas. It is the main objective of this paper to give an overview of the wide range of diverse plasma generation methods and plasma sources and highlight the broad spectrum of plasma properties which, in turn, lead to a wide range of diverse technological and technical applications.

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“…"Plasma" mainly consists of positive and negative ions, radicals, electrons, and excited or ground state of atoms, which results from subjecting a gas to an energy source (Conrads and Schmidt, 2000;Ramazzina et al, 2015). Energy is delivered in sequence to the electrons and the heavy species via collisions, leading to the destruction of chemical species.…”

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Investigation of HID-lamp light emission differences for different power supply methods

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