Plasma etching: Yesterday, today, and tomorrow

Donnelly, Vincent M.; Kornblit, A.

doi:10.1116/1.4819316

Cited by 607 publications

(434 citation statements)

References 333 publications

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“…Fig. 12 shows results for NF 2 , for which no experimental data were available. The predictions were generated by Tennyson and collaborators (42) using the UK molecular R-matrix codes (43).…”

Section: Connecting Fundamental Data With Modeling Applicationsmentioning

confidence: 99%

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Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology

Bartschat

Kushner

2016

Proc. Natl. Acad. Sci. U.S.A.

107

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Electron collisions with atoms, ions, molecules, and surfaces are critically important to the understanding and modeling of low-temperature plasmas (LTPs), and so in the development of technologies based on LTPs. Recent progress in obtaining experimental benchmark data and the development of highly sophisticated computational methods is highlighted. With the cesium-based diode-pumped alkali laser and remote plasma etching of Si 3 N 4 as examples, we demonstrate how accurate and comprehensive datasets for electron collisions enable complex modeling of plasma-using technologies that empower our high-technology-based society.electron scattering | close coupling | ab initio | plasmas | kinetic modeling Electron collisions with atoms, ions, molecules, and surfaces are critically important to the understanding and the modeling of laboratory plasmas, astrophysical processes, lasers, and planetary atmospheres, to name just a few examples. In addition to the investigation of naturally occurring phenomena, electron collisions form the basis of a vast array of plasma-using technologies, which continue to empower our high-technology-based society (1). Atomic, molecular, and optical (AMO) physics, the field that encompasses electron-atom and electron-molecule collisions, has made tremendous contributions to our fundamental understanding of nature. Despite the field's longevity, breakthrough developments in atomic collisions continue to be made at the fundamental level of both experiment and theory. The Need for Atomic and Molecular DataIn low-temperature plasmas (LTPs), electron and ion collisions with otherwise unreactive gas and surfaces activate those atoms and molecules through forming excited states, ions, and radicals. Those activated species are then used in applications ranging from microelectronics fabrication (2) to human healthcare (3). The most basic, necessary, and first step in the development of those technologies is the electron or ion impact with the initially unreactive species to produce the activated species. As a result, fundamental AMO physics is closely and beneficially connected to technology development.Examples of experimental progress in advancing the knowledge base for LTPs include, but are certainly not limited to, the "magnetic angle changer" (MAC) (4) and the so-called "reaction microscope" (RM) (5). The MAC makes it possible to carry out measurements of electron impact cross sections in angular regimes that were previously inaccessible because of geometric limitations due to the position of the electron gun. Furthermore, taking advantage of dramatic improvements in detector technology and fast electronics, the RM has enabled unparalleled detailed studies of electron-atom and electron-molecule collision processes over a wide range of parameters (energies, angles), and so provided an extensive database to test theory.At the same time, theoretical and particularly computational advances have made the calculation of data for atomic/molecular structure as well as electron collision processes both r...

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Section: Connecting Fundamental Data With Modeling Applicationsmentioning

confidence: 99%

“…Those activated species are then used in applications ranging from microelectronics fabrication (2) to human healthcare (3). The most basic, necessary, and first step in the development of those technologies is the electron or ion impact with the initially unreactive species to produce the activated species.…”

Section: The Need For Atomic and Molecular Datamentioning

confidence: 99%

Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology

Bartschat

Kushner

2016

Proc. Natl. Acad. Sci. U.S.A.

107

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“…From the mid-1960s, the mechanisms of plasma etching were first introduced as a revolutionary technique for the fabrication of integrated circuit [46]. In the 1970s, it was widely accepted and expected to be an important fabrication technique in the industry of semiconductor and other applications requiring fine-line lithography [47].…”

Section: Plasma Etchingmentioning

confidence: 99%

Selection of micro-fabrication techniques on stainless steel sheet for skin friction

et al. 2016

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This review gives a concise introduction to the state-of-art techniques used for surface texturing, e.g., wet etching, plasma etching, laser surface texturing (LST), 3D printing, etc. In order to fabricate deterministic textures with the desired geometric structures and scales, the innovative texturing technologies are developed and extended. Such texturing technology is an emerging frontier with revolutionary impact in industrial and scientific fields. With the help of the latest fabrication technologies, surface textures are scaling down and more complex deterministic patterns may be fabricated with desired functions, e.g., lotus effect (hydrophobic), gecko feet (adhesive), haptic tactile, etc. The objective of this review is to explore the surface texturing technology and its contributions to the applications.

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“…Ceramics such as sintered alumina are thermally and chemically resistant and can withstand temperatures as high as 42000°C (Ref. 42) and aggressive applications in, for example, oven linings and plasma-etching equipment 43 . Some ceramics are also piezoelectrics and can therefore be applied in both sensors and microactuators.…”

Section: Precision In Harsh Environments P French Et Almentioning

confidence: 99%

Precision in harsh environments

2016

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Microsystems are increasingly being applied in harsh and/or inaccessible environments, but many markets expect the same level of functionality for long periods of time. Harsh environments cover areas that can be subjected to high temperature, (bio)-chemical and mechanical disturbances, electromagnetic noise, radiation, or high vacuum. In the field of actuators, the devices must maintain stringent accuracy specifications for displacement, force, and response times, among others. These new requirements present additional challenges in the compensation for or elimination of cross-sensitivities. Many state-of-the-art precision devices lose their precision and reliability when exposed to harsh environments. It is also important that advanced sensor and actuator systems maintain maximum autonomy such that the devices can operate independently with low maintenance. The next-generation microsystems will be deployed in remote and/or inaccessible and harsh environments that present many challenges to sensor design, materials, device functionality, and packaging. All of these aspects of integrated sensors and actuator microsystems require a multidisciplinary approach to overcome these challenges. The main areas of importance are in the fields of materials science, micro/nano-fabrication technology, device design, circuitry and systems, (first-level) packaging, and measurement strategy. This study examines the challenges presented by harsh environments and investigates the required approaches. Examples of successful devices are also given.

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Plasma etching: Yesterday, today, and tomorrow

Cited by 607 publications

References 333 publications

Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology

Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology

Selection of micro-fabrication techniques on stainless steel sheet for skin friction

Precision in harsh environments

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