Plasma etching for micromechanical sensor applications

Rangelow, Ivo W.; Skocki, S.; Dumania, P.

doi:10.1016/0167-9317(94)90174-0

Cited by 32 publications

(15 citation statements)

References 4 publications

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“…A significant improvement in the performance of the piezoresistive cantilever with respect to deflection sensitivity was identified using a Wheatstone bridge circuit, with temperature drift compensation noted one year later. 25 Based on this technology, different SPM sensors, such as tribological, thermal and Kelvin-probes were developed. 26 Integration of a sharp tip expanded this MEMS technology into real 3D-micromachining.…”

Section: Compact Piezoresistive and Self-actuated Cantileversmentioning

confidence: 99%

Scanning probes in nanostructure fabrication

Kaestner

Ivanov

Schuh

et al. 2014

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Articles you may be interested inMechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers J. Vac. Sci. Technol. B 30, 06F204 (2012); 10.1116/1.4766916 Development, analysis and control of a high-speed laser-free atomic force microscope Rev. Sci. Instrum. 81, 023707 (2010);Scanning probes have enabled modern nanoscience and are still the backbone of today's nanotechnology. Within the technological development of AFM systems, the cantilever evolved from a simple passive deflection element to a complex microelectromechanical system through integration of functional groups, such as piezoresistive detection sensors and bimaterial based actuators. Herein, the authors show actual trends and developments of miniaturization efforts of both types of cantilevers, passive and active. The results go toward the reduction of dimensions. For example, the authors have fabricated passive cantilever with a width of 4 lm, a length of 6 lm and thickness of 50-100 nm, showing one order of magnitude lower noise levels. By using active cantilevers, direct patterning on calixarene is demonstrated employing a direct, development-less phenomena triggered by tip emitted low energy (<50 eV) electrons. The scanning probes are not only applied for lithography, but also for imaging and probing of the surface before and immediately after scanning probe patterning. In summary, piezoresistive probes are comparable to passive probes using optical read-out. They are able to routinely obtain atomic step resolution at a low thermal noise floor. The active cantilever technology offers a compact, integrated system suited for integration into a table-top scanning probe nanolithography tool.

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Section: Compact Piezoresistive and Self-actuated Cantileversmentioning

confidence: 99%

Scanning probes in nanostructure fabrication

Kaestner

Ivanov

Schuh

et al. 2014

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…13,14 Four ͑p-type doped͒ resistors aligned in ͗110͘ direction were implemented in the cantilever forming an electrical Wheatstone bridge. 13,14 Four ͑p-type doped͒ resistors aligned in ͗110͘ direction were implemented in the cantilever forming an electrical Wheatstone bridge.…”

Section: Afm Probe With Integrated Sensormentioning

confidence: 99%

Atomic force microscopy and lateral force microscopy using piezoresistive cantilevers

Linnemann¹

1996

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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In this article a novel probe for atomic force microscopy will be introduced. It is based on a conventional micromachined silicon cantilever with an integrated electronic sensor which determines the cantilever deflection. The principle setup of this probe is described and a theoretical and an experimental investigation of the sensitivity of the probe will be presented. The probe is suitable for operation in the static as well as in the dynamic mode and was employed for imaging various materials. To enhance the sensitivity of the detection system and to obtain simultaneously a cantilever with a small spring constant, the geometry of the cantilever was modified. Finite element method calculations were performed to get the optimum sensor design. Furthermore, a different cantilever concept was designed to perform lateral force microscopy as well.

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“…Piezoresistive cantilevers usually use thin p doped resistors positioned at high stress locations lengthwise on the bending beam. 25 Due to the piezoresistive effect, mechanical stress, which is induced within the resistors, leads to changes in their specific resistance. By biasing via a fixed current, this change is converted into an electrical voltage signal.…”

Section: Self-sensing and Self-actuated Probes And Arraysmentioning

confidence: 99%

“…Using combined CMOS and MEMS techniques, several types of active cantilevers and tips have been demonstrated. 12 We introduce in 1994 the Wheatstone bridge configuration 25 for the piezoresistive readout and later on the thermomechanical actuation.…”

Section: Tailoring Toward Specific Applications: Modification Of Amentioning

confidence: 99%

“…26 A significant improvement in performance of such cantilevers with respect to piezoresistive deflection sensitivity and temperature stability has been achieved by using an integrated Wheatstone bridge configuration. 25,27 Here, effective crosstalk isolation and temperature drift compensation have been employed. Furthermore, due to the optimized piezoresistor technology, a significantly improved signal to noise ratio was achieved leading to current sensitivities and force gradient resolution, which are equal to the optical read-out techniques.…”

Section: Self-sensing and Self-actuated Probes And Arraysmentioning

confidence: 99%

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Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Rangelow

Ivanov

Ahmad

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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With the recent advances in the field of nanotechnology, measurement and manipulation requirements at the nanoscale have become more stringent than ever before. In atomic force microscopy, high-speed performance alone is not sufficient without considerations of other aspects of the measurement task, such as the feature aspect ratio, required range, or acceptable probe-sample interaction forces. In this paper, the authors discuss these requirements and the research directions that provide the highest potential in meeting them. The authors elaborate on the efforts toward the downsizing of self-sensed and self-actuated probes as well as on upscaling by active cantilever arrays. The authors present the fabrication process of active probes along with the tip customizations carried out targeting specific application fields. As promising application in scope of nanofabrication, field emission scanning probe lithography is introduced. The authors further discuss their control and design approach. Here, microactuators, e.g., multilayer microcantilevers, and macroactuators, e.g., flexure scanners, are combined in order to simultaneously meet both the range and speed requirements of a new generation of scanning probe microscopes.

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Plasma etching for micromechanical sensor applications

Cited by 32 publications

References 4 publications

Scanning probes in nanostructure fabrication

Scanning probes in nanostructure fabrication

Atomic force microscopy and lateral force microscopy using piezoresistive cantilevers

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

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