Plasma etching—A discussion of mechanisms

Coburn, J. W.; Winters, Harold F.

doi:10.1116/1.569958

Cited by 572 publications

(168 citation statements)

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“…investigations on plasma processes from literature. [207][208] 10 sccm oxygen flow significantly reduced the etching rates to 16 nm·min -1 (408 nm colloids) and 18 nm·min -1 (246 nm colloids).…”

Section: Effect Of Plasma Powermentioning

confidence: 99%

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Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Section: Effect Of Plasma Powermentioning

confidence: 99%

“…The phenomenon is related to smaller etching rates of silicon dioxide compared to silicon that are reported for reactive ion beam etching experiments. [207] Figure 5.2.12. Effect of substrate material on the size-reduction process.…”

Section: Effect Of the Substratementioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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“…From the mid-1960s, the mechanisms of plasma etching were first introduced as a revolutionary technique for the fabrication of integrated circuit [46]. In the 1970s, it was widely accepted and expected to be an important fabrication technique in the industry of semiconductor and other applications requiring fine-line lithography [47]. In general, plasma etching undergoes a chemical reaction between the solid atoms from the substrate material and gas atoms from the gas etchant.…”

Section: Plasma Etchingmentioning

confidence: 99%

Selection of micro-fabrication techniques on stainless steel sheet for skin friction

et al. 2016

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This review gives a concise introduction to the state-of-art techniques used for surface texturing, e.g., wet etching, plasma etching, laser surface texturing (LST), 3D printing, etc. In order to fabricate deterministic textures with the desired geometric structures and scales, the innovative texturing technologies are developed and extended. Such texturing technology is an emerging frontier with revolutionary impact in industrial and scientific fields. With the help of the latest fabrication technologies, surface textures are scaling down and more complex deterministic patterns may be fabricated with desired functions, e.g., lotus effect (hydrophobic), gecko feet (adhesive), haptic tactile, etc. The objective of this review is to explore the surface texturing technology and its contributions to the applications.

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“…Then, the exposed oxidized silicon surface was etched by silicon deep reactive ion etching (12) to form microwells using buffered hydrofluoric acid as a solvent of silicon dioxide. Then, a fluorocarbon polymer was formed on the photoresist and the sidewall of a microwell using plasmaenhanced chemical vapor deposition (13). Finally, the photoresist was removed and the fluorocarbon polymer was lifted off the surface of the silicon chip.…”

Section: Microwell Array Chipmentioning

confidence: 99%

Single lymphocyte analysis with a microwell array chip

et al. 2007

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Following genomics and proteomics, cytomics, a novel method of looking at life, has emerged for analyzing large populations of cells on a single-cell basis with multiple parameters in a quantitative manner. We have developed a highly integrated live-cell microarray system for analyzing the cellular responses of individual cells using a microwell array chip that has 234,000 microwells each of which is just large enough to fit a single cell. Compared with flow cytometry and microscope-based methods, our system can analyze the history of the cellular responses of a large number of cells. We have successfully applied the system to analyze human antigen-specific B-cells and produced human monoclonal antibodies (MoAb) against hepatitis B virus surface antigen. We have also constructed a mouse system to assess hepatitis B virus-neutralization activity and have demonstrated the neutralization activity of our antibodies. Our technology should expand the horizons of cell analysis as well as enable generation of human MoAb for antibody-based therapeutics and diagnosis for infectious diseases such as hepatitis viruses. '

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Plasma etching—A discussion of mechanisms

Abstract: Mechanisms in plasma etching

Cited by 572 publications

References 0 publications

Surface Patterning with Colloidal Monolayers

Surface Patterning with Colloidal Monolayers

Selection of micro-fabrication techniques on stainless steel sheet for skin friction

Single lymphocyte analysis with a microwell array chip

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