We investigated effects of amplitude modulated (AM) capacitively coupled Ar discharge plasma on the ion energy distribution function (IEDF) and the ion angular distribution function (IADF) incident on electrodes using the particle-in-cell/Monte Carlo collision model. For AM discharge, the electron density and electron temperature and the kinetic energy and angle of ions incident on the ground electrode change periodically with AM frequency, whereas ones for continues wave discharge are almost constant. For AM discharge, the plasma had hysteresis characteristics. The variation width of the peak energy of IEDF and the full width at half maximum (FWHM) of IADF increase with the AM level. These effects of AM method discharge are more noticeable at lower pressures. Thus, the AM discharge offers a way to control simultaneously IEDF and IADF, which opens a new avenue of plasma processes such an ALD-like PECVD.