Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes: particle-in-cell/Monte Carlo collision model simulation

Abe, Kohei; Kamataki, Kunihiro; Yamamoto, Akihiro; Nagao, Iori; Otaka, Michihiro; Yamashita, Daisuke; Okumura, Takamasa; Yamashita, Naoto; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu

doi:10.35848/1347-4065/ac7626

Cited by 3 publications

(2 citation statements)

References 59 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This density fluctuation is not strictly consistent with the phase of the FM waveform but has a delay of about 0.2 FM period (1 µs) between the maximum density and the maximum frequency of 18 MHz. Recently, Abe et al [45]. observed a similar phenomenon in amplitude modulated (AM) driven CCP discharges.…”

Section: Electron Kineticsmentioning

confidence: 71%

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Wang,

Zhou,

Chen

et al. 2024

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

Capacitively coupled plasma (CCP) is widely used in plasma etching and deposition processes because of its low cost, simple structure, and easy generation of a uniform plasma in large areas. Conventional CCPs are operated under a fixed frequency power source; however, CCPs driven by a variable frequency power source are poorly understood. In this paper, numerical simulations of CCPs driven by frequency modulated (FM) radio frequency (RF) sources within the frequency range of 2 MHz to 18 MHz are carried out with a Particle-in-Cell/Monte Carlo collision model. Our research indicates that the CCP driven by an FM RF source can maintain a stable glow discharge and form a time-dependent plasma. Plasma density, electron and ion current, energy and heating rate, ion flux, and energy on the electrodes fluctuate consistently with the FM period. The electron and ion energy distribution function can also be modulated by the frequency variation of the FM source. A multi-peak structure that varies and shifts with frequency variation is observed in the ion energy distribution function. In addition, by fixing the chirp period while varying the start or end frequency of the chirp signal (start frequency from 0.4 to 6 MHz, or end frequency from 18 to 48 MHz), effective modulations can be produced on the electron density, electron energy, and the shape of the EEPF and IEDF.

show abstract

Section: Electron Kineticsmentioning

confidence: 71%

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Wang,

Zhou,

Chen

et al. 2024

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…We demonstrated that AM discharge method can improve the side step coverage and film quality of SiO2 thin films over pattered substrates fabricated by TEOS-PECVD [14]. Moreover, we investigated effects of AM discharge plasmas on IEDF and IADF incident on electrodes using the particle-in-cell/Monte Carlo collision (PIC-MCC) model [20,21]. These PIC-MCC simulation results clarified that the widths of change in the peak of IEDF and FWHM of IADF are controlled by AM level.…”

Section: Introductionmentioning

confidence: 99%

Ion Trajectory Control in Processing Plasmas for Nano-Fabrication

Otomo,

Nagao,

Kamataki

et al. 2023

KEM

Self Cite

View full text Add to dashboard Cite

To realize ion trajectory control in processing plasmas for nano-fabrication, we applied amplitude modulation (AM) discharges to control of ion trajectory in high aspect trenches. We investigated behavior of incident ions in AR25 (aspect ratio = 25) trench structure in AM discharges using data of Ar+ ion with ion energy and ion angular distribution functions (IEDF and IADF) on the substrate obtained by the PIC-MCC model. AM discharges have higher ion flux onto the trench sidewalls than the continuous waveform (CW) discharges, whereas AM discharges have almost the same ion energy as CW ones. SRIM simulation results suggest that AM discharges can desorb more hydrogen atoms from TEOS-PECVD SiO2 films on the trench sidewall than CW ones, which explains the previous results of improved SiO2 film quality on trench sidewall by AM discharges.

show abstract

One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges

et al. 2022

View full text Add to dashboard Cite

Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes: particle-in-cell/Monte Carlo collision model simulation

Cited by 3 publications

References 59 publications

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Ion Trajectory Control in Processing Plasmas for Nano-Fabrication

One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges

Contact Info

Product

Resources

About