Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source
Yu Wang,
Youyou Zhou,
Jian Chen
et al.
Abstract:Capacitively coupled plasma (CCP) is widely used in plasma etching and deposition processes because of its low cost, simple structure, and easy generation of a uniform plasma in large areas. Conventional CCPs are operated under a fixed frequency power source; however, CCPs driven by a variable frequency power source are poorly understood. In this paper, numerical simulations of CCPs driven by frequency modulated (FM) radio frequency (RF) sources within the frequency range of 2 MHz to 18 MHz are carried out wit… Show more
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