CVD Polymers 2015
DOI: 10.1002/9783527690275.ch6
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Plasma Enhanced‐Chemical Vapor Deposited Polymers: Plasma Phase Reactions, Plasma–Surface Interactions, and Film Properties

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Cited by 4 publications
(3 citation statements)
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“…When calculating the pore size distribution from the relative porosity accessible to the probe molecules, the amount of pores with diameters in the range 0.27–0.42 nm was found to be 2.61 ± 0.02%, the same measured for SiO 2, n 1.426 . It can be concluded that the densification process due to the higher plasma power density has mainly an effect on the pores with a larger diameter, as reported in the literature …”
Section: Resultssupporting
confidence: 69%
“…When calculating the pore size distribution from the relative porosity accessible to the probe molecules, the amount of pores with diameters in the range 0.27–0.42 nm was found to be 2.61 ± 0.02%, the same measured for SiO 2, n 1.426 . It can be concluded that the densification process due to the higher plasma power density has mainly an effect on the pores with a larger diameter, as reported in the literature …”
Section: Resultssupporting
confidence: 69%
“…An excellent overview of the plasma-chemical and physical processes can be found by Michelmore et al [7]. Many excellent reviews and books have been published in recent years beside still valuable elderly review articles to discuss several aspects of plasma surface treatment and coating of polymers [8][9][10][11][12][13]. Different plasma sources and equipment have been developed and improved over years including capacitively and inductively coupled plasmas (CCP and ICP), microwave (MW), arc and magnetron discharges as well as combinations running with continuous or modulated (pulsed) power from low pressure (LP) to atmospheric pressure (AP).…”
Section: Plasma Surface Engineering-general Overviewmentioning
confidence: 99%
“…Accordingly, plasma polymers show highly branched and crosslinked structures different to conventional polymers [30]. Hence, both plasma chemistry (by the selection of the starting molecules and their energy uptake) and plasma physics (by the role of ions during plasmasurface interaction) are key parameters for the engineering of manmade soft materials and deposition of functional films [12,13].…”
Section: Plasma Surface Engineering-general Overviewmentioning
confidence: 99%