Plasma distribution in a triple-cathode vacuum arc deposition apparatus

Abstract

The distribution of plasma beams produced by Ti, Nb and Zr cathodes in a triple-cathode vacuum arc deposition system was studied. The system consisted of a triple-cathode plasma gun, straight plasma duct, sample chamber, vacuum system and computerized control system. Three cathodes were located on a circle centred on the system axis. An arc was ignited between the cathodes and an anode with three apertures, each located opposite one of the cathodes. Each cathode had a separate trigger ignition system and the cathodes could be operated simultaneously or separately. The plasma produced by the cathode spots passed through the anode aperture to a 160 mm diameter straight duct. Four magnetic field coils coaxial with the duct axis produced a magnetic field to collimate the plasma flow, and two beam steering coils whose axes were normal to the duct axis produced a magnetic field that deflected the plasma beam in the x and y directions. The saturated ion current distribution in the plasma was measured by a 13-segment multi-probe which was positioned in the sample chamber at a distance of 560 mm from the cathode plane. The measurements were carried out for each cathode operated separately in vacuum and in a background nitrogen gas at pressures of 0.4-1.33 Pa.The ion currents collected by the individual elements of the multi-probe were fitted to a two-dimensional Gaussian function. It was shown that the beam steering coils displaced the plasma beam centres in a wide range in the substrate plane. Changing the current of the X or Y steering coils displaced the beam centre linearly in the x or y directions respectively, but had only a weak effect in the y or x (i.e. orthogonal) directions respectively. The background nitrogen pressure did not influence the displacements of the plasma beam centres; however increasing nitrogen pressure decreased the distribution width. The results show that the pair of beam steering coils may direct the plasma beams to any position in the substrate plane without affecting the other beam distribution parameters.

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

“…This can been realized using a pulsed cathodic plasma source with more than one cathode [209,210]. For example, for the deposition of tetrahedral amorphous carbon (t-aC), the most diamond-like material in the family of diamond-like materials, it is desirable to apply bias of about -100 V [211,212].…”