Plasma Diagnostics: Use and Justification in an Industrial Environment

Abstract

The importance of plasma diagnostics at semiconductor equipment manufacturers has increased steadily over the past decade. The design and procurement of advanced etching tools now require a full host of plasma diagnostics and modeling capability. Examples of these activities at a semiconductor equipment manufacturer will be given, with specifics of significant and useful results. Examples include the development and optimization of an inductive plasma source, trend analysis and hardware effects on ion energy distributions, and mass spectrometry influences on process development. Discussion will focus on plasma diagnostics for in-house development and proliferation in an environment with strong financial justification requirements.

On the Parameters of Inductively Coupled and Microwave BF3 Plasmas Used for Plasma Immersion Ion Implantation

“…Plasma‐aided material processing in the semiconductor industry requires the production of large diameter homogeneous discharges with high ion densities and reactive species concentrations and with low electron temperatures. Plasma diagnostics plays the essential role in the development and optimization of plasma processing tools 2–4. One of the fundamental questions in research on plasma processing is the determination of such plasma parameters as electron temperature ( T e ), electron number density ( n e ), positive and negative ions number densities ( n + , n − ), and electron energy distribution function (EEDF).…”