Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

Hong, Seung Pyo; Lim, Jae‐Hak; Gweon, Gwang Ho; Yeom, Geun Young

doi:10.1143/jjap.49.080217

Cited by 12 publications

(7 citation statements)

References 5 publications

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“…Various plasma source designs, such as segmented and gridded antennas together with capacitively coupled plasmas (CCPs) [6], have been proposed and implemented to reduce the standing wave effect. Improved radial uniformity has been demonstrated by using C-type ferrite enhancement in inductively coupled plasmas (ICPs) [7]. Various other configurations of plasma sources such as CCPs, very high frequency capacitively coupled plasmas (VHF-CCPs) and ICPs (ferrite core assisted and dual-comb-type antennas) have been proposed and investigated [8][9][10][11][12][13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Mishra¹,

Seo²,

Kim³

et al. 2013

J. Phys. D: Appl. Phys.

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Using an emissive probe technique in 'saturated floating-potential' mode, an investigation of temporal evolution of plasma potential (V p) in a large-area pulsed dual-frequency (2 MHz/13.56 MHz) inductively coupled plasma (p-DF-CCP) is carried out. The discharge is sustained by an external type ICP antenna at a pressure of 10 mTorr in argon gas environment. The 2 MHz rf is pulsed at a frequency of 1 kHz and a duty ratio of 50%. The emissive probe is located at the centre of the substrate and 20 mm above (r = 00 mm and z = −20 mm) it. The low-frequency power (P 2 MHz) is varied from 100 to 800 W, whereas the high-frequency power (P 13.56 MHz) from 100 to 700 W. V p remains positive during the whole pulse period. The prominent features in the V p profile remain similar under all operating conditions; however, the magnitude of V p depends on the applied rf powers. For further investigation, three distinct regions in a typical V p profile are clearly identified as 'overshoot-immediately after pulse begins', the 'on-time' and the 'off-time'. V p increases with increasing P 13.56 MHz and has reverse trend with P 2 MHz. The electron temperature (T e) is calculated using the relation between floating potential (V f) and plasma potential (V p) for the argon plasma and it is found that T e increases with increasing P 13.56 MHz and decreases with P 2 MHz. It is found that V p could be modulated using a suitable power combination on two frequencies (P 13.56 MHz /P 2 MHz). This paper is an attempt to investigate the time-resolved V p and T e with rf powers in a pulsed dual-frequency ICP.

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Section: Introductionmentioning

confidence: 99%

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Mishra¹,

Seo²,

Kim³

et al. 2013

J. Phys. D: Appl. Phys.

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show abstract

“…With the rapid development of semiconductor manufacturing, various plasma sources based on different mechanisms of electromagnetic power absorption, e.g., inductively coupled plasma (ICP) sources, capacitively coupled plasma (CCP) sources, electron cyclotron resonance sources and surface wave excited plasma sources, are being extensively investigated [1][2][3][4]. Among these plasma sources, ICPs have been acted as a great candidate because of its desirable characteristics, e.g.…”

Section: Introductionmentioning

confidence: 99%

Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Hua¹,

Song²,

Hao³

et al. 2018

Plasma Sci. Technol.

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Experimental results of a direct current enhanced inductively coupled plasma (DCE-ICP) source which consists of a typical cylindrical ICP source and a plate-to-grid DC electrode are reported. With the use of this new source, the plasma characteristic parameters, namely, electron density, electron temperature and plasma uniformity, are measured by Langmuir floating double probe. It is found that DC discharge enhances the electron density and decreases the electron temperature, dramatically. Moreover, the plasma uniformity is obviously improved with the operation of DC and radio frequency (RF) hybrid discharge. Furthermore, the nonlinear enhancement effect of electron density with DC+RF hybrid discharge is confirmed. The presented observation indicates that the DCE-ICP source provides an effective method to obtain high-density uniform plasma, which is desirable for practical industrial applications.

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“…Many schemes, based on multiple frequencies, power splitting mechanism, pulse shape tailoring, and customized shape of bias power, have been proposed. [16][17][18][19][20][21][22][23][24][25][26][27][28][29] Recently, a new approach, based on using dual frequency and power splitting mechanism in ICP source, has been proposed to provide a good discharge uniformity and control on discharge parameters. 30,31 Pulsing the plasma source provides an added flexibility in controlling the discharge parameters and proves to be an important tool for tailoring discharge parameters specific to a particular application.…”

Section: Introductionmentioning

confidence: 99%

Ion energy distributions in a pulsed dual frequency inductively coupled discharge of Ar/CF4 and effect of duty ratio

et al. 2015

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Controlling time averaged ion energy distribution (IED) is becoming increasingly important in many plasma material processing applications for plasma etching and deposition. The present study reports the evolution of ion energy distributions with radio frequency (RF) powers in a pulsed dual frequency inductively discharge and also investigates the effect of duty ratio. The discharge has been sustained using two radio frequency, low (P 2 MHz ¼ 2 MHz) and high (P 13.56 MHz ¼ 13.56 MHz) at a pressure of 10 mTorr in argon (90%) and CF 4 (10%) environment. The low frequency RF powers have been varied from 100 to 600 W, whereas the high frequency powers from 200 to 1200 W. Typically, IEDs show bimodal structure and energy width (energy separation between the high and low energy peaks) increases with increasing P 13.56 MHz ; however, it shows opposite trends with P 2 MHz. It has been observed that IEDs bimodal structure tends to mono-modal structure and energy peaks shift towards low energy side as duty ratio increases, keeping pulse power owing to mode transition (capacitive to inductive) constant. V

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Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

Cited by 12 publications

References 5 publications

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Ion energy distributions in a pulsed dual frequency inductively coupled discharge of Ar/CF4 and effect of duty ratio

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