Plasma Cathode Electron Sources

Computer modeling of extraction and transport of high-current charged particle beams

“…4b and 4a, the aperture diameters equal 1 mm and 1.5 mm, respectively), but, for diameters that are larger than 1.8 mm, attempts to obtain a beam have not met with success because of plasma penetration from the discharge region into the accelerating gap. These results of calculations conform to the results of experimental works [7,8]. The form of the aperture also plays an important role in the formation of a beam (see Fig.…”

Direct Current Plasma Electron Source for Electric Propulsion Applications Using Atomic and Molecular Propellants

“…The extraction orifice is dimensioned according to the theory of electron extraction from a plasma source covered in [11] and [24]. From this theort it is anticipated that the most stable extraction would be achieved with an orifice of 1.8 mm diameter and a neutral pressure of 0.3 Torr inside the neutralizer.…”

“…A plasma cathode does not rely on a thermionic emissive material and, instead, relies on ionization and electron generation in the bulk plasma [11]. Depending on the type of discharge, plasma cathodes can be grouped in radio frequency (RF) cathodes, capacitively coupled plasma (CCP) [12] and inductively couple plasma (ICP) [13], [14], microwave cathodes [15], [16], electron cyclotron resonance (ECR) cathodes [17], helicon cathodes [18], and direct current (DC) cathodes [19].…”

Generation of large cross-sectional area electron beams by a fore-vacuum-pressure plasma electron source based on the arc discharge

“…One of the main problems involved in the formation of large cross-sectional area electron beams by plasma electron sources is cross-sectional uniformity of the beam current density distribution [1]. The latter is determined by the uniformity of the cathode plasma emission boundary and parameters of the plasma in the transport region.…”

“…Electron-beam technologies are widely used for treatment and surface modification of different materials [1,2]. However processing of non-conducting (dielectric) materials in conventional vacuum range (< 10 -1 Pa) is problematical because non-conducting surfaces are charged by electron beam [3].…”