Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Abstract

After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modelling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used 1 of PBII&D to produce surgical implants, bio-and blood-compatible surfaces and coatings, etc.With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures.We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.2

Structure and Properties of Nanocrystalline Coatings Titanium Nitride Coating Deposition Received at Arc Discharge With Hf and Stimulation

“…Áûëî îáíàðó-aeåíî òî ÷òî ñ óìåíüøåíèåì ðàçìåðà çåðíà äî 10 è ìåíåå íàíîìåòðîâ, ðåçêî óëó÷øàþòñÿ ôè-çèêî-ìåõàíè÷åñêèå ñâîéñòâà, êîòîðûå â ñâîþ î÷åðåäü çàâèñÿò îò óñëîâèé è ìåòîäîâ îñàaeäå-íèÿ ýòèõ ïîêðûòèé [5][6][7][8][9].…”

“…Íàíåñå-íèå ïîêðûòèé ñóùåñòâåííî ñíèçèëî îáúåìíûé èçíîñ îáðàçöîâ. Èçíîñ ìàòåðèëà ñ ïîäëîaeêè èìåë êàòàñòðîôè÷åñêèé [6,7] õàðàêòåð, òîãäà êàê ïîêðûòèÿ ýòîé ñòàäèè íå äîñòèãàëè äî ñà-ìîãî êîíöà èñïûòàíèé. Ïðè áàçîâûõ èñïûòà-íèÿõ íà 10000 îáîðîòîâ íè îäíî èç ïîêðûòèé íå ïðîòåðëîñü è íå îáíàaeèëî ïîäëîaeêó.…”

The relationship between visible light emission and species fraction of the hydrogen ion beams extracted from 2.45 GHz microwave discharge

“…[1][2][3] For the hydrogen specific case, a profound interest on plasma processes determining the ion species fraction dynamics is emerging due to the necessity of H + 2 and H + 3 molecular ion beams for different applications from hadron therapy to neutrino experiments. [4][5][6] Recent results demonstrate the capabilities of the 2.45 GHz plasma sources for producing intense beams of molecular hydrogen ions.…”

Hydrogenated amorphous carbon as protective coating for a forming tool

“…Specific studies should be developed to adjust the stress level and to promote stronger connections to the particular substrate without deteriorating other properties. Plasma immersion ion implantation and deposition, PIIID [3], is a potential technique for improving the adhesion of a-C:H films since it enables dilution of the substrate material with film constituents by C ion implantation. With adjusting the pulse characteristics and plasma intrinsic parameters, it is possible to control the energy of the implanted ions and then the characteristics of both film and substrate.…”