2013
DOI: 10.1039/c3ta10337d
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Plasma-assisted simultaneous reduction and nitrogen doping of graphene oxide nanosheets

Abstract: An environmentally benign and scalable route for the production of gram scale quantities of nitrogen-doped graphene using a downstream microwave plasma source is reported. Simultaneous reduction and doping of graphene oxide is achieved and the process negates the need for high temperatures and toxic solvents associated with existing methods. This gas-phase low temperature process is completely dry and, thus, minimises re-aggregation of graphene flakes which is typically associated with liquid phase reduction m… Show more

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Cited by 203 publications
(150 citation statements)
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References 28 publications
(41 reference statements)
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“…The plasma treatment process described here has previously been shown to be suitable for the plasma treatment and functionalisation of extremely fragile graphene films 31,32 and has successfully been used in the reduction and N-doping of graphene oxide powder. 33 X-ray Photoelectron Spectroscopy (XPS) was carried out using a monochromated Al Ka source in conjunction with an Omicron EA 125 hemispherical analyser. Combined instrumental and source resolutions for C 1s and N 1s regions with pass energy of 20 eV were B0.55 eV.…”
Section: Methodsmentioning
confidence: 99%
“…The plasma treatment process described here has previously been shown to be suitable for the plasma treatment and functionalisation of extremely fragile graphene films 31,32 and has successfully been used in the reduction and N-doping of graphene oxide powder. 33 X-ray Photoelectron Spectroscopy (XPS) was carried out using a monochromated Al Ka source in conjunction with an Omicron EA 125 hemispherical analyser. Combined instrumental and source resolutions for C 1s and N 1s regions with pass energy of 20 eV were B0.55 eV.…”
Section: Methodsmentioning
confidence: 99%
“…Kumar et al 85 addressed this problem by performing simultaneous reduction and nitrogen doping of graphene at room temperature. The reduction was achieved by introducing bulk quantities of graphene oxide to downstream microwave plasma with gas mixture of H 2 and NH 3 (50 sccm each) working at 500W power.…”
Section: Nitrogen Functionalizationmentioning
confidence: 99%
“…31 This technique boasts a one-step process which negates the requirement for corrosive or toxic chemicals or high temperature treatments during the reduction process. As it has widely been reported in the literature that N-doped …”
mentioning
confidence: 99%
“…31 This technique boasts a one-step process which negates the requirement for corrosive or toxic chemicals or high temperature treatments during the reduction process. As it has widely been reported in the literature that N-doped graphene enhances the performance of graphene-based supercapacitors, we propose that the N-rGO produced via ammonia plasma treatment of GO is suitable for such an application.…”
mentioning
confidence: 99%