Plasma-assisted hydrogen generation: A mechanistic review

Recent Progress on Hydrogen Production from Ammonia Decomposition: Technical Roadmap and Catalytic Mechanism

“…To produce clean H 2 , various technologies have been developed, such as thermocatalytic NH 3 decomposition, photocatalytic NH 3 decomposition, plasma-catalytic NH 3 decomposition, and electrocatalytic NH 3 decomposition. Figure 2 shows the advantages and disadvantages of each method [ 10 , 11 , 13 , 14 , 15 , 16 , 17 , 18 ]. Understanding these methods is key to determining the current capabilities of the NH 3 -to-H 2 conversion technologies.…”

“…Thermocatalytic decomposition of NH 3 generally occurs at a temperature above 873 K, while traditional thermal reforming or decomposition of NH 3 typically requires a high temperature of about 1300 K. Despite the presence of a catalyst, the reaction temperature is still relatively high, restricting the reaction’s useful applications. To start chemical reactions at lower temperatures, researchers have investigated the potential of alternate strategies involving electrical discharges or non-thermal plasmas [ 18 , 21 , 51 ]. Researchers have explored the potential of plasma-catalytic NH 3 decomposition.…”

Methane Pyrolysis with the Use of Plasma: Review of Plasma Reactors and Process Products

“…Surely, in many cases, plasma provides a gas temperature high enough that thermally driven processes, like in classical pyrolysis, are accessible. A more-comprehensive description of the plasma-assisted methane decomposition mechanisms is given in [25,26]. Finally, it should be noted that the discussed process of methane conversion can be referred to as pyrolysis, decomposition, dissociation, coupling, or non-oxidative coupling.…”

“…Although there have already been a few review articles that consider the plasma pyrolysis of methane, these works often emphasize different parts of the topic. For example, works [9,25] focus mainly on hydrogen production. Work [26] discusses plasmaassisted methane reforming in general, e.g., including steam and dry reforming.…”

Comparative Passivation of Si(100) by H2 and D2 Atmospheres under Simultaneous Xe+ Bombardment: An X-ray Photoelectron Spectroscopy Analysis

“…H 2 and D 2 are commonly applied to passivate Si substrates in the microelectronic industry to prevent contamination, such as H 2 O, which is present in the base pressure of standard vacuum vessels. − Additionally, passivation finds various applications in thin film technologies, serving as anticorrosive protection and interface functionalization and creating hard coatings. − Passivation of dangling bonds is crucial in hydrogenated amorphous silicon materials. , Furthermore, the research on the retention of hydrogen and isotopes on the surface holds significant potential for nuclear fusion energy. , Tokamak reactors commonly employ hydrogen and isotopes as fuel sources, and the interaction of these species in the plasma state on the inner walls of the reactor has garnered significant attention in current studies. − Moreover, hydrogen storage assisted by plasma has garnered attention from several research groups. , To control the physical–chemical mechanisms of passivation, factors like the surface state, temperature, and sticking coefficient must be taken into consideration. − …”