Comparative Passivation of Si(100) by H₂ and D₂ Atmospheres under Simultaneous Xe⁺ Bombardment: An X-ray Photoelectron Spectroscopy Analysis

Abstract

This study presents a comparison of H 2 and D 2 passivation on Si(100) under simultaneous Xe + ion bombardment. The impact of Xe + ions causes significant damage to the substrate surface, leading to an increase in H 2 (D 2 ) retention as Si−H (Si−D) bonds. The ion bombardment conditions are precisely controlled using a Kaufman ion gun. The atomic concentrations on the surface of the sample were investigated by quasi-in situ X-ray photoelectron spectroscopy. A simple methodology is employed to estimate the H (D) chemical concentration and the cover ratio of the sample, with regard to the oxygen concentration through residual water chemisorption present in the vacuum vessel. Differences in passivation are expected when using H 2 or D 2 atmospheres because their retained scission energies and physisorption properties differ. The results indicate an increase of the sticking coefficient for D 2 and H 2 under the ion bombardment. It is also found that the flux of H 2 (D 2 ) impinging on the surface contributes to play an important role in the whole process. Finally, a model is proposed to describe the phenomenon of the passivation of Si under Xe + ion bombardment in the presence of H 2 (D 2 ).