Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature

Abstract

Plasma-assisted chemical vapor deposition (PCVD) at pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at temperature under 40˚C. Plasma optical emission spectroscopy and FTIR indicated that density of OH group in the amorphous layer was related to the density of OH or H 2 O in the plasma and the species was formed on electrode to induce the RF-power. Hydrophilicity on the layer was dependent on the density of chemisorbed OH, but was degraded by the excess OH. The PCVD-TiO x coating was demonstrated on polyethylene terephthalate and showed good hydrophilic property with the contact angle of water about 5˚.

Surface treatment of TiO2 nanoparticles via sol–gel method: Effect of silane type on hydrophobicity of the nanoparticles

“…The reconstructed peaks at the region of 3015-3530 cm −1 can be attributed to the physically adsorbed water (around 3008 cm −1 ) and chemisorbed OH to Ti (around 3200 cm −1 , 3400 cm −1 ) [34]. Also, the sharp band at around 1616 cm −1 , observed in all spectra can be assigned to the physically water adsorbed on the surface of TiO 2 [38,39].…”

“…The absorption bands around 500 cm −1 , which are recognized due to short-range O-Ti-O network amorphous TiO x[34] or Ti-O stretching[35] and Ti-O-Ti (820 cm −1 )…”

Enhanced Photo-Induced Property of LPCVD-TiO<SUB>2</SUB> Layer on PCVD-TiO<SUB>x</SUB> Initial Layer

“…In contrast, if the partially dissociated precursor consisting of (RO) x Ti (OH) 4−x reacts to reactive species on the substrate surface, orientation of the nucleation is limited by the reaction. As previously reported, it is expected OH-species chemisorbed to Ti are included in the PCVD-TiO x layer deposited at such low temperatures [15]. Although the OH-species may be desorbed from the layer before the LPCVD at 360˚C, the partially dissociated precursor supplied to the surface with the residual chemisorbed-OH occurs oxolation to form (RO) x Ti-O-TiO x at the surface, which certainly control the nuclei.…”

“…Typical emissions due to H-and H 2 -radicals were observed with CO-radicals but the emission originated from O, O 2 and OH was not detected in the plasma. In the case that oxidant species such as oxygen or hydroxyl enhance TTIP-dissociation in TiO-R bond, CO and CO 2 is formed in the plasma [15]. However, the spectrum without the peak due to the oxidants indicated TTIP was partially dissociated in Ti-OR bond and CO formed by cracking of the dissociated OR, which was resulted in Ti-rich (O-poor) TiO x layer deposition linearly increasing the thickness with the deposition period as shown in Figure 5.…”

Nanofriction Properties of Mono- and Double-Layer Ti3C2Tx MXenes

“…44 All of these interactions are available in the Ti 3 C 2 T x MXenes because of the possible wide range of the termination groups. The IR band located at 3336 cm −1 is linked to O−H hydroxyl groups chemisorbed to Ti 45 and/or C atoms 43 as well as water molecules physisorbed on the surface. 41,46 The latter is less likely, as other bands related to O−H interactions (1636− 1680, 47−49 1400, and 1211 cm −1 ) were not observed here, indicating a low concentration of the water molecules on the surface.…”