Planar plano-convex microlens in silica using ICP-CVD and DRIE

Markweg, Eric; Hillenbrand, Matthias; Sinzinger, Stefan; Hoffmann, Martin

doi:10.1117/12.981266

Cited by 3 publications

(4 citation statements)

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“…Hybrid GRIN lenses using different mechanisms for light deflection in vertical and horizontal directions are feasible with optimized RIE structuring and are suited, e.g., to wafer-level coupling of optical and optoelectronic components. 83 To this end, a sequential approach for the well-defined deposition of thin layers with slightly varying material composition has been demonstrated and combined with the planar RIE approach. This planar stack of materials effectively forms a one-dimensional GRIN material in which the light propagation perpendicular to the substrate is determined through the refractive index variation.…”

Section: Integrated 3d Microstructured Grin Lensesmentioning

confidence: 99%

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Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro-and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass-plasma/mask-plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Section: Integrated 3d Microstructured Grin Lensesmentioning

confidence: 99%

“…Fig.8(a) Principle of 3D beam shaping by a GRIN lens; (b) and (c) SEM pictures of fabricated GRIN lenses using PECVD deposition and subsequently plasma structuring on a silicon substrate 83. …”

mentioning

confidence: 99%

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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“…Currently silicon microlenses with a curved surface can only be manufactured via plasma etching with thermally formed polymer microlens as the etch mask, and these suffer from the fundamental hurdles stated above. Markweg et al [29] proposed a novel approach by engineering the refractive index in the vertical direction whilst creating a geometrical profile in the orthogonal direction parallel to the substrate. This allowed the beam to be focused along the propagation axis.…”

Section: Introductionmentioning

confidence: 99%

CMOS compatible fabrication of micro, nano convex silicon lens arrays by conformal chemical vapor deposition

et al. 2017

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We present a novel CMOS-compatible fabrication technique for convex micro-nano lens arrays (MNLAs) with high packing density on the wafer scale. By means of conformal chemical vapor deposition (CVD) of hydrogenated amorphous silicon (a-Si:H) following patterning of silicon pillars via electron beam lithography (EBL) and plasma etching, large areas of a close packed silicon lens array with the diameter from a few micrometers down to a few hundred nanometers was fabricated. The resulting structure shows excellent surface roughness and high uniformity. The optical focusing properties of the lenses at infrared wavelengths were verified by experimental measurements and numerical simulation. This approach provides a feasible solution for fabricating silicon MNLAs compatible for next generation large scale, miniaturized optical imaging detectors and related optical devices.

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“…These existing drawbacks can be significantly mitigated by incorporating a planar microlens pairs. 10 Other applications that can benefit from the development of such planar microlens pairs include free-space optical interconnects on chip. 11 The analysis of a planar microlens pair that allows lowloss free-space transmission of light between two opposing waveguides/fibers has been reported 12,13 for potential applications in optical cross-connect switches and optical interconnects.…”

Section: Introductionmentioning

confidence: 99%

Planar microlens with front-face angle: design, fabrication, and characterization

Hafiz

Michael

Kwok

2016

J. Micro/Nanolith. MEMS MOEMS

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Planar plano-convex microlens in silica using ICP-CVD and DRIE

Cited by 3 publications

References 0 publications

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Perspectives of reactive ion etching of silicate glasses for optical microsystems

CMOS compatible fabrication of micro, nano convex silicon lens arrays by conformal chemical vapor deposition

Planar microlens with front-face angle: design, fabrication, and characterization

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