2012
DOI: 10.1088/1748-0221/7/10/p10028
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Planar pixel sensors for the ATLAS upgrade: beam tests results

Abstract: The performance of planar silicon pixel sensors, in development for the ATLAS Insertable B-Layer and High Luminosity LHC (HL-LHC) upgrades, has been examined in a series of beam tests at the CERN SPS facilities since 2009. Salient results are reported on the key parameters, including the spatial resolution, the charge collection and the charge sharing between adjacent cells, for different bulk materials and sensor geometries. Measurements are presented for n + -in-n pixel sensors irradiated with a range of flu… Show more

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Cited by 26 publications
(28 citation statements)
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“…The 150 µm thick sensors were obtained from an older production at MPG-HLL on SOI 6" wafers while the 285 µm thick sensors were produced on 4" wafers at CIS, as described in more details in [12]. For all the values of the hit efficiencies quoted in the following, the dominant source of uncertainty is systematic and evaluated to be 0.3%, as explained in [16]. After an irradiation fluence between 4 and 6 × 10 15 n eq /cm 2 , FE-I4 modules with 150 and 200 µm thick sensors show similar performances reaching a hit efficiency of about 97% at V bias =500V, while the same module type with a 100µm thick sensor starts to saturate to this value Figure 3: Hit efficiency as a function of the bias voltage for pixel modules of different thicknesses irradiated to a fluence between 4 and 6 × 10 15 n eq /cm 2 .…”
Section: Characterization Of Sensors With Different Thickness After Imentioning
confidence: 99%
“…The 150 µm thick sensors were obtained from an older production at MPG-HLL on SOI 6" wafers while the 285 µm thick sensors were produced on 4" wafers at CIS, as described in more details in [12]. For all the values of the hit efficiencies quoted in the following, the dominant source of uncertainty is systematic and evaluated to be 0.3%, as explained in [16]. After an irradiation fluence between 4 and 6 × 10 15 n eq /cm 2 , FE-I4 modules with 150 and 200 µm thick sensors show similar performances reaching a hit efficiency of about 97% at V bias =500V, while the same module type with a 100µm thick sensor starts to saturate to this value Figure 3: Hit efficiency as a function of the bias voltage for pixel modules of different thicknesses irradiated to a fluence between 4 and 6 × 10 15 n eq /cm 2 .…”
Section: Characterization Of Sensors With Different Thickness After Imentioning
confidence: 99%
“…The impact point of a track is calculated in the middle of the thickness of the active bulk, and a cluster is associated to a track if the track crossed at least one of its pixels. An absolute systematic uncertainty of 0.3% is associated to all hit efficiency measurements in this paper according to [8].…”
Section: Module Characterizationmentioning
confidence: 99%
“…The global module efficiency and the hit efficiency at the sensor edge have been extracted. The FE-I3 and FE-I4 modules yield a global efficiency of (99.9 +0.1 −0.3 )% and (99.8 +0.2 −0.3 )% respectively, at a bias voltage of 20 V. The dominant source of the uncertainty for these measurements is systematic, and it has been evaluated as described in [10]. Fig.2 shows the hit efficiency obtained over the edge pixel column, as a function of the distance from the end point of the pixel implant, for the sensor design with only a guard-ring.…”
Section: Active Edge Pixelsmentioning
confidence: 99%