2016
DOI: 10.1016/j.nima.2016.03.081
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Development of n-in-p pixel modules for the ATLAS upgrade at HL-LHC

Abstract: Thin planar pixel modules are promising candidates to instrument the inner layers of the new ATLAS pixel detector for HL-LHC, thanks to the reduced contribution to the material budget and their high charge collection efficiency after irradiation. 100-200 µm thick sensors, interconnected to FE-I4 read-out chips, have been characterized with radioactive sources and beam tests at the CERN-SPS and DESY. The results of these measurements are reported for devices before and after irradiation up to a fluence of 14 × … Show more

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Cited by 9 publications
(8 citation statements)
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“…The expected cluster width along η strongly depends on the sensor thickness as visualised in Fig. 3(a) and thinner sensors produce smaller clusters [13,15]. This is in good agreement with the observed cluster widths for the sensor thicknesses of 100, 150 and 200 µm displayed in Fig.…”
Section: The Thin N-in-p Pixel Production With Active and Slim Edges supporting
confidence: 82%
“…The expected cluster width along η strongly depends on the sensor thickness as visualised in Fig. 3(a) and thinner sensors produce smaller clusters [13,15]. This is in good agreement with the observed cluster widths for the sensor thicknesses of 100, 150 and 200 µm displayed in Fig.…”
Section: The Thin N-in-p Pixel Production With Active and Slim Edges supporting
confidence: 82%
“…It is almost constant over the sensor depth, except for the entrance and exit pixels that are not entirely crossed by the track. The obtained hit efficiency of a single pixel for the 200 µm thick sensor is 94.9% and hence it is (4-5)% lower than the one of 100 µm thickness presented in [4]. The hit efficiency was calculated with varying assumptions on the allowed number of holes between two pixels inside the cluster, up to a maximum of 10.…”
Section: Performance At High Incident Anglementioning
confidence: 96%
“…In the present design of the ATLAS pixel sensors it is possible to bias the pixel via the punch-through mechanism with an n + implant dot implemented in the pixel cell, connected to the bias ring through an aluminium rail. It has been observed that these structures introduce a loss of efficiency after irradiation [3,4]. To reduce this effect, an optimization has been carried out, comparing the performance of the different designs shown in Fig.…”
Section: Test Beam Analysis Of Different Pixel Cell Designsmentioning
confidence: 99%
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“…With increasing radiation fluence the bias voltage needed for sufficient depletion must be increased, eventually reaching values of more than 500 V at Note the small distance between readout chip and guard ring implants; (c) n + -in-p sensor hit efficiency as a function of bias voltage for different fluences and various thicknesses [52].…”
Section: Planar Pixel Sensorsmentioning
confidence: 99%