2002
DOI: 10.1109/tns.2002.803881
|View full text |Cite
|
Sign up to set email alerts
|

PICTS analysis of extended defects in heavily irradiated silicon

Abstract: We report the results of an experimental study on radiation-induced defects in silicon p + n diodes irradiated with 1-MeV neutrons up to a fluence of 2.3 10 15 cm 2 . Heavily irradiated silicon diodes have been studied by means of Photo Induced Current Transient Spectroscopy (PICTS) technique using a variable filling time. For every filling time, a dominant broad and structured peak has been found in the temperature range 200-300 K. Such a broad peak cannot be accounted for by considering isolated point defect… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2004
2004
2006
2006

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 29 publications
0
1
0
Order By: Relevance
“…It is well known that the degradation of the detectors with irradiation is caused by lattice defects, like creation of vacancies (point-like defects) or damage regions (cluster), independently from the material used for their realization, and, again, that a crucial aspect for the understanding of the defect kinetics at a microscopic level is the correct identification of the crystal defects in terms of their electrical activity. The understanding of the defect kinetics, in fact, would inform how to modify deliberately the material in order to reduce the degradation of the electrical properties of the detectors [16]- [18].…”
Section: Introductionmentioning
confidence: 99%
“…It is well known that the degradation of the detectors with irradiation is caused by lattice defects, like creation of vacancies (point-like defects) or damage regions (cluster), independently from the material used for their realization, and, again, that a crucial aspect for the understanding of the defect kinetics at a microscopic level is the correct identification of the crystal defects in terms of their electrical activity. The understanding of the defect kinetics, in fact, would inform how to modify deliberately the material in order to reduce the degradation of the electrical properties of the detectors [16]- [18].…”
Section: Introductionmentioning
confidence: 99%