Picoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples

Investigation of total reflection X-ray fluorescence calibration with picoliter deposition arrays

“…For example, a 10 pL deposition of 0.25 g/L Ni solution is between 600 and 700 nm thick based on cross sectional secondary electron microscopy and atomic force microscopy. On the other hand, Auger electron spectroscopy data of a 10 pL deposition of 0.0025 g/L Ni solution showed Si signal in the Ni deposition area indicating that the Ni residue is thinner than the approximately 2 nm information depth of the Auger analysis [8]. The highest concentration of Ni deposited in this calibration study was 0.006 g/L Ni, so it is expected that the residues will be more film-like and below the critical thickness for analyte signal attenuation from the matrix.…”

“…Previous picoliter deposition studies [8] have shown that the lower the metal concentration in the deposition solution is the thinner and more film-like the residue will be. For example, a 10 pL deposition of 0.25 g/L Ni solution is between 600 and 700 nm thick based on cross sectional secondary electron microscopy and atomic force microscopy.…”

“…Sixteen arrays can be deposited on a 200 mm wafer. Further details on the deposition procedure can be found in reference [8].…”

Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials

“…268 The droplets were spaced no more than 100 mm apart and had a diameter of approximately 5-20 mm. It has, therefore, also found significant use during this review period.…”

Detecting gold in semiconducting advanced nanomaterials based on tin oxide via total reflection X-ray fluorescence analysis

“…Applying total reflection X ray fluorescence analysis (TRXF) allows solid state analysis of small mass samples with a high accuracy and a minimum preliminary sample treatment [2]. However, the accuracy of results obtained via this method depends on the matrix composition, surface morphology, and sample mass, as well as on the cali bration technique [3][4][5]. We have earlier revealed that detecting ruthenium via a nonstandard method in solid samples leads to a high amount of error, while the recovery of the alloying detection via TRXF in the solution is higher than in the analysis of suspensions [6].…”