Physical Vapor Deposition

Westwood, W. D.

doi:10.1007/978-94-009-0917-5_4

Cited by 31 publications

(3 citation statements)

References 114 publications

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“…Physical Vapor Deposition of Metals on TMC Surfaces. The deposition of Pt, Au, Ag, or Cu on the prepared TMC thin films was conducted by a physical vapor deposition (PVD) method 28 in ultrahigh vacuum (UHV) conditions by resistively heating tungsten filaments wrapped with 99.99% pure metal wires of the desired metal. Before PVD was conducted, TMC foils were dipped in 0.3 M NaOH for 15 min to remove passivated oxide layers.…”

Section: Experimental and Theoretical Methodsmentioning

confidence: 99%

Trends and Descriptors of Metal-Modified Transition Metal Carbides for Hydrogen Evolution in Alkaline Electrolyte

et al. 2019

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In this study, the experimentally measured hydrogen evolution reaction exchange current densities for metal monolayer-modified transition metal carbides (TMCs) are correlated with density functional theory calculations of adsorbed hydrogen and hydroxyl binding energies. The correlation reveals a volcano relationship in alkaline electrolytes, while the hydroxyl binding energy does not appear to show a strong correlation. These results should provide guidance for further improving the electrocatalytic activity of metal-modified TMCs in an alkaline environment.

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Section: Experimental and Theoretical Methodsmentioning

confidence: 99%

Trends and Descriptors of Metal-Modified Transition Metal Carbides for Hydrogen Evolution in Alkaline Electrolyte

et al. 2019

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“…(17)(18)(19)(20)(21)(22) In the simplest form, depicted in Fig. 2a, sputtering is obtained by generating a beam of inert-gas ions, accelerating the beam to energies of a few kV, and directing the beam at a target composed of the material to be deposited.…”

Section: Sputter Depositionmentioning

confidence: 99%

Physical and Chemical Methods for Thin-Film Deposition and Epitaxial Growth

Arthur

2002

Specimen Handling, Preparation, and Treatments in Surface Characterization

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“…P HYSICAL vapor deposition (PVD) is a widely used method for thin film growth in which material is vaporized from a source, transported as a vapor, and condensed onto a target [1]- [3]. It is used in a wide range of applications including coatings [4], diffusion barriers [5], micro/nanoelectronics [6], [7], magnetic films for data storage [8]- [10], synthesis of 2D materials [11], [12], synthesis of quench condensed superconductors [13]- [16], and synthesis of nano/micro patterned metal structures [17]- [20]. Generally, these systems are large, expensive, and slow to start and stop deposition.…”

Section: Introductionmentioning

confidence: 99%

A Chip-Scale, Low Cost PVD System

Barrett

Lally

Fuhr

et al. 2020

J. Microelectromech. Syst.

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Standard physical vapor deposition systems are large, expensive, and slow. As part of an on-going effort to build a fab-on-a-chip, we have developed a chip-scale, low cost, fast physical vapor deposition system designed to be used with atomic calligraphy or dynamic stencil lithography to direct write nanostructures. The system comprises two MEMS devices: a chip-scale thermal evaporator and a mass sensor that serves as a film thickness monitor. Here, we demonstrate the functionality of both devices by depositing Pb thin-films. The thermal evaporator was made by fabless manufacturing using the SOIMUMPs processs (MEMSCAP, inc). It turns on in 1:46 s and reaches deposition rates as high as 7.2Å s −1 with ∼ 1 mm separation from the target. The mass sensor is a re-purposed quartz oscillator (JTX210) that is commercially available for less than one dollar. Its resolution was measured to be 2.65 fg or 7.79E-5 monolayers of Pb.[2020-0237] Index Terms-Physical vapor deposition (PVD), evaporation, fab-on-a-chip, MEMS, mass sensor, quartz oscillator, film thickness monitor, phased locked loop.

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Physical Vapor Deposition

Cited by 31 publications

References 114 publications

Trends and Descriptors of Metal-Modified Transition Metal Carbides for Hydrogen Evolution in Alkaline Electrolyte

Trends and Descriptors of Metal-Modified Transition Metal Carbides for Hydrogen Evolution in Alkaline Electrolyte

Physical and Chemical Methods for Thin-Film Deposition and Epitaxial Growth

A Chip-Scale, Low Cost PVD System

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