Physical properties of highly oriented spray-deposited fluorine-doped tin dioxide films as transparent conductor

Agashe, Chitra; Hüpkes, J.; Schöpe, G.; Berginski, M.

doi:10.1016/j.solmat.2009.01.021

Cited by 96 publications

(60 citation statements)

References 37 publications

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“…A preferred orientation can also be affected by experimental parameters, such as the growth temperature [29,30], coating thickness [31] and fluorine doping level [9,11].…”

Section: Structural Propertiesmentioning

confidence: 99%

Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

et al. 2014

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Fluorine doped tin oxide (FTO) coatings have been prepared using the mid-frequency pulsed DC closed field unbalanced magnetron sputtering technique in an Ar/O2 atmosphere using blends of tin oxide and tin fluoride powder formed into targets. FTO coatings were deposited with a thickness of 400 nm on glass substrates. No post-deposition annealing treatments were carried out. The effects of the chemical composition on the structural (phase, grain size), optical (transmission, optical band-gap) and electrical (resistivity, charge carrier, mobility) properties of the thin films were investigated. Depositing FTO by magnetron sputtering is an environmentally friendly technique and the use of loosely packed blended powder targets gives an efficient means of screening candidate compositions, which also provides a low cost operation. The best film characteristics were achieved using a mass ratio of 12% SnF2 to 88% SnO2 in the target. The thin film produced was polycrystalline with a tetragonal crystal structure. The optimized conditions resulted in a thin film with average visible transmittance of 83% and optical band-gap of 3.80 eV, resistivity of 6.71 × 10

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“…A preferred orientation can also be affected by experimental parameters, such as the growth temperature [29,30], coating thickness [31] and fluorine doping level [9,11].…”

Section: Structural Propertiesmentioning

confidence: 99%

Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

et al. 2014

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“…[ 27 ] This fi lm was used in the fabrication of the solar cell with a glass/graphene/ CdS/CdTe/(graphite paste) confi guration as schematically illustrated in Figure S7a (Supporting Information). In addition, we explored another confi guration: glass/graphene/ZnO/CdS/ are superior to other TCFs especially at long wavelengths [20][21][22] as shown in Figure 2 d for seven-layer ones. These optical and electrical properties are also much better than those of the CVD graphene fi lms ( ≈ 1 k Ω sq − 1 , 90.2% transparency) grown with a Ni fi lm catalyst on SiO 2 /Si [ 6 ] (Table 1 ) and the 800 ° C annealed fi lm (8 k Ω sq − 1 , ≈ 80% transparency) fabricated from graphene oxide.…”

Section: Doi: 101002/adma201100645mentioning

confidence: 99%

Transparent Conductive Graphene Films Synthesized by Ambient Pressure Chemical Vapor Deposition Used as the Front Electrode of CdTe Solar Cells

et al. 2011

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“…[33] Afify et al and Agashe et al reported that the (200) plane is particularly sensitive to substrate temperature which controls the growth of the films. [34,35] Belanger et al prepared FTO films by CVD and observed that for films with a thickness of around 0.4 mm the dominant planes were found to be the (200), (400), (301) and (211). [36] Belanger et al also found that deep trap levels of grain boundaries surfaces are mostly associated with the (110), (211) and (301) orientations and not with the (200) plane.…”

Section: Resultsmentioning

confidence: 99%

Textured Fluorine‐Doped Tin Dioxide Films formed by Chemical Vapour Deposition

Bhachu

Waugh

Zeissler

et al. 2011

Chemistry A European J

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The use of an aerosol delivery system enabled fluorine-doped tin dioxide films to be formed from monobutyltin trichloride methanolic solutions at 350-550 °C with enhanced functional properties compared with commercial standards. It was noted that small aerosol droplets (0.3 μm) gave films with better figures of merit than larger aerosol droplets (45 μm) or use of a similar precursor set using atmospheric pressure chemical vapour deposition (CVD) conditions. Control over the surface texturing and physical properties of the thin films were investigated by variation in the deposition temperature and dopant concentration. Optimum deposition conditions for low-emissivity coatings were found to be at a substrate temperature of about 450 °C with a dopant concentration of 1.6 atm% (30 mol% F:Sn in solution), which resulted in films with a low visible light haze value (1.74%), a high charge-carrier mobility (25 cm(2) V s(-1)) and a high charge-carrier density (5.7×10(20) cm(-3)) resulting in a high transmittance across the visible (≈80%), a high reflectance in the IR (80% at 2500 nm) and plasma-edge onset at 1400 nm. Optimum deposition conditions for coatings with applications as top electrodes in thin film photovoltaics were found to be a substrate temperature of about 500 °C with a dopant concentration of 2.2 atm% (30 mol% F:Sn in solution), which resulted in films with a low sheet resistance (3 Ω sq(-1)), high charge-carrier density (6.4×10(20) cm(-3)), a plasma edge onset of 1440 nm and the films also showed pyramidal surface texturing on the micrometer scale which corresponded to a high visible light haze value (8%) for light scattering and trapping within thin film photovoltaic devices.

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Physical properties of highly oriented spray-deposited fluorine-doped tin dioxide films as transparent conductor

Cited by 96 publications

References 37 publications

Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Transparent Conductive Graphene Films Synthesized by Ambient Pressure Chemical Vapor Deposition Used as the Front Electrode of CdTe Solar Cells

Textured Fluorine‐Doped Tin Dioxide Films formed by Chemical Vapour Deposition

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