Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use

Sedira, Sofiane; Achour, S.; Avcı, Ahmet; Eskizeybek, Volkan

doi:10.1016/j.apsusc.2014.01.010

Cited by 50 publications

(25 citation statements)

References 36 publications

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“…A stretching vibration of Ti-O bond appears at 660 cm −1 and proves the formation of TiO 2 [51]. No sharp absorption peak corresponding to stretching vibrations of Ti-N is observed due to its high reflectivity of infrared light [52]. are consistent with the reported data [48,49].…”

Section: Materials Characterizations and Analysissupporting

confidence: 91%

RETRACTED: Nitrogen Doped Intercalation TiO2/TiN/Ti3C2Tx Nanocomposite Electrodes with Enhanced Pseudocapacitance

et al. 2020

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Layered two-dimensional titanium carbide (Ti3C2Tx), as an outstanding MXene member, has captured increasing attention in supercapacitor applications due to its excellent chemical and physical properties. However, the low gravimetric capacitance of Ti3C2Tx restricts its rapid development in such applications. Herein, this work demonstrates an effective and facile hydrothermal approach to synthesize nitrogen doped intercalation TiO2/TiN/Ti3C2Tx with greatly improved gravimetric capacitance and excellent cycling stability. The hexamethylenetetramine (C6H12N4) in hydrothermal environment acted as the nitrogen source and intercalants, while the Ti3C2Tx itself was the titanium source of TiO2 and TiN. We tested the optimized nitrogen doped intercalation TiO2/TiN/Ti3C2Tx electrodes in H2SO4, Li2SO4, Na2SO4, LiOH and KOH electrolytes, respectively. The electrode in H2SO4 electrolyte delivered the best electrochemical performance with high gravimetric capacitance of 361 F g−1 at 1 A g−1 and excellent cycling stability of 85.8% after 10,000 charge/discharge cycles. A systematic study of material characterization combined with the electrochemical performances disclosed that TiO2/TiN nanoparticles, the introduction of nitrogen and the NH4+ intercalation efficaciously increased the specific surface areas, which is beneficial for facilitating electrolyte ions transportation. Given the excellent performance, nitrogen doped intercalation TiO2/TiN/Ti3C2Tx bodes well as a promising pseudocapacitor electrode for energy storage applications.

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Section: Materials Characterizations and Analysissupporting

confidence: 91%

RETRACTED: Nitrogen Doped Intercalation TiO2/TiN/Ti3C2Tx Nanocomposite Electrodes with Enhanced Pseudocapacitance

et al. 2020

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“…Fourier‐transform infrared (FTIR) spectra of the pristine and the cleaned surfaces ( Figure ) show the characteristics bands of TiN film deposited through sputtering, as recently observed elsewhere . However, in comparison with the pristine one, a new broad absorption band between 3000 and 3500 cm –1 appears in the FTIR spectrum of the cleaned sample.…”

Section: Resultssupporting

confidence: 69%

Grafting of Aminoethylphosphonic Acid Monolayers on Titanium Nitride: The Effect of Surface Pretreatments through Electrochemical‐Assisted Oxidation

Zeb

2016

Adv Materials Inter

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The surface of titanium nitride (TiN) contains, in addition to nitride compounds, a certain amount of native oxide. This oxide allows the functionalization of TiN with amine‐terminated groups through spontaneous self‐assembly of aminoethylphosphonic acid. However, real industrial applications of titanium nitride, particularly for microelectronics and electrochemistry, require the development of efficient methods to improve the aminoethylphosphonate loading while preserving the main intrinsic characteristics of the TiN substrate. It is demonstrated that surface pretreatment, by either electrochemical anodization or cleaning in H2O2:HCl:H2O mixture, considerably enhances the phosphonic loading. This is the first report on mild oxidation of TiN surface using an acidic peroxide mixture. This electrochemical‐assisted method does not require any electrochemical equipment, and works through simple immersion of the TiN surface in the cleaning solution at room temperature. Moreover, cleaning in this solution leads to a significantly increased quantity of the grafted phosphonate groups via uniform hydroxylation of the entire surface, without altering the behavior of the pristine TiN. The electrochemical anodization technique, which results in quasicomplete conversion of surface TiN compounds to TiO2 under our working conditions, needs further fundamental investigation towards incorporation of oxygen into the TiN lattice.

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“…This type of ceramic can be employed as diffusion barrier in microelectronics, protective coatings for biomedical devices, hard and decorative coatings of mechanical tools or for manufacturing micro-gap discharge devices. The properties that make titanium nitride suitable for applications such as mentioned above are its high hardness, good adhesive wear and resistance to corrosion, high melting temperature, thermal and chemical stability, biocompatibility and so forth [6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications

Merie

Pustan

Negrea

et al. 2015

Applied Surface Science

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Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use

Cited by 50 publications

References 36 publications

RETRACTED: Nitrogen Doped Intercalation TiO2/TiN/Ti3C2Tx Nanocomposite Electrodes with Enhanced Pseudocapacitance

RETRACTED: Nitrogen Doped Intercalation TiO2/TiN/Ti3C2Tx Nanocomposite Electrodes with Enhanced Pseudocapacitance

Grafting of Aminoethylphosphonic Acid Monolayers on Titanium Nitride: The Effect of Surface Pretreatments through Electrochemical‐Assisted Oxidation

Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications

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