Abstract:Flexible and self-powered deep ultraviolet (UV) photodetectors are pivotal for next-generation electronic skins to enrich human life quality. The fabrication of epitaxial β-Ga2O3 thin films is challenging on flexible substrates due to high-temperature growth requirements. Herein, β-Ga2O3 ($$\stackrel{-}{2}$$
2
-
0 1) films are hetero-epitaxially grown on ultra-thin and environment-friendly muscovite mica which is the… Show more
Gallium oxide (β-Ga2O3) is emerging as a promising wide-bandgap semiconductor for optoelectronic and high-power electronic devices. In this study, deep-level defects were investigated in pulsed-laser-deposited epitaxial films of β-Ga2O3. A deep ultraviolet photodetector (DUV) fabricated on β-Ga2O3 film showed a slow decay time of 1.58 s after switching off 250 nm wavelength illumination. Generally, β-Ga2O3 possesses various intentional and unintentional trap levels. Herein, these traps were investigated using the fractional emptying thermally stimulated current (TSC) method in the temperature range of 85 to 473 K. Broad peaks in the net TSC curve were observed and further resolved to identify the characteristic peak temperature of individual traps using the fractional emptying method. Several deep-level traps having activation energies in the range of 0.16 to 1.03 eV were identified. Among them, the trap with activation energy of 1.03 eV was found to be the most dominant trap level and it was possibly responsible for the persistent photocurrent in PLD-grown β-Ga2O3 thin films. The findings of this current work could pave the way for fabrication of high-performance DUV photodetectors.
Gallium oxide (β-Ga2O3) is emerging as a promising wide-bandgap semiconductor for optoelectronic and high-power electronic devices. In this study, deep-level defects were investigated in pulsed-laser-deposited epitaxial films of β-Ga2O3. A deep ultraviolet photodetector (DUV) fabricated on β-Ga2O3 film showed a slow decay time of 1.58 s after switching off 250 nm wavelength illumination. Generally, β-Ga2O3 possesses various intentional and unintentional trap levels. Herein, these traps were investigated using the fractional emptying thermally stimulated current (TSC) method in the temperature range of 85 to 473 K. Broad peaks in the net TSC curve were observed and further resolved to identify the characteristic peak temperature of individual traps using the fractional emptying method. Several deep-level traps having activation energies in the range of 0.16 to 1.03 eV were identified. Among them, the trap with activation energy of 1.03 eV was found to be the most dominant trap level and it was possibly responsible for the persistent photocurrent in PLD-grown β-Ga2O3 thin films. The findings of this current work could pave the way for fabrication of high-performance DUV photodetectors.
“…Overall, the flexible PZT film on mica exhibits high epitaxial quality and excellent ferroelectricity, which can be tuned by mechanical strain. Besides, other oxides have also been demonstrated, including transparent conducting oxides Al-ZnO (AZO) and ITO ( Bitla et al., 2016 ), magnetic CFO ( Liu et al., 2017a , 2017b ), BaFe 12 O 19 ( Ke et al., 2021 ) and Fe 3 O 4 ( Zheng et al., 2018 ), antiferroelectric PbHfO 3 (PHO) ( Tsai et al., 2021 ) and PbZrO 3 (PZO) ( Ko et al., 2021 ), wide bandgap semiconductor Ga 2 O 3 ( Tak et al., 2020 ), conducting SRO ( Liu et al., 2018 ), ferroelectric Pr-doped Ba 0.85 Ca 0.15 Ti 0.9 Zr 0.1 O 3 (BCTZ:Pr) ( Zheng et al., 2019a ), BiFeO 3 (BFO) ( Sun et al., 2020a , 2020b ) and PZT ( Jiang et al., 2017 ), colossal magnetoresistance Pr 0.5 Ca 0.5 MnO 3 (PCMO) ( Yen et al., 2020 ), phase transition VO 2 ( Li et al., 2016 ), etc. …”
Section: Fabrication Of High-quality Flexible Oxide Thin Filmsmentioning
“…β-Ga 2 O 3 has a high breakdown electric field strength of 8 MV/cm and exceptional Baliga figure of merit (BFOM) and Johnson’s figure of merit (JFOM) due to ultrawide bandgap of 4.6–4.9 eV, much higher than those of SiC and GaN. β-Ga 2 O 3 has a high saturation electron velocity ( v s ) of 2 × 10 7 cm/s, which allows for high current density and high-frequency operation. ,− …”
Ultrawide
bandgap β-gallium oxide (β-Ga2O3) is emerging as a viable candidate for next-generation high-power
electronics, including Schottky barrier diodes (SBDs) and field-effect
transistors (FETs). This is due to its excellent material properties
such as ultrawide bandgap of 4.6–4.9 eV, high breakdown electric
field of 8 MV/cm, very high Baliga’s figure of merit (BFOM)
and mature technology for large bulk single crystals, and epitaxial
techniques with controllable n-type doping. Ohmic and rectifying metal–semiconductor
contacts on β-Ga2O3 have been developed
over the past decade. This work comprehensively reviews the recent
development of metal–semiconductor contacts on β-Ga2O3. We start with basic concepts of metal–semiconductor
contacts, which is followed by summarizing the current literature
on ohmic and Schottky contacts on β-Ga2O3. Finally, the status of high-power Schottky diode contact on β-Ga2O3 is presented.
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