Photothermal spectroscopy study of fused silica irradiated by a 355 nm wavelength and 68 ns pulse duration laser

Yan, Chunyan; Liu, Baoan; Li, Xiangcao; Liu, Chang; Ju, Xin

doi:10.1364/ome.9.003439

Cited by 5 publications

(5 citation statements)

References 34 publications

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“…The detail of the apparatus is described in Ref. [24]. This method was used for measuring the on-line photothermal absorption signals of samples before and after laser irradiation damage.…”

Section: Photothermal Spectroscopy Measurementmentioning

confidence: 99%

“…[22,23] Photothermal spectroscopy is a non-contact and non-destructive method to measure the absorption defects on the surface and in bulk of optical element. [24,25] Compared with other absorption measurement methods, photothermal technology has the advantages of high sensitivity (< 10 ppb), high spatial resolution (< 1 µm). Photothermal absorption measurement based on photothermal effect is a relative measurement technology.…”

Section: Introductionmentioning

confidence: 99%

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Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate*

Yan¹,

Liu²,

Li³

et al. 2020

Chinese Phys. B

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Time-dependent damage to fused silica induced by high frequency ultraviolet laser is investigated. Photothermal spectroscopy (PTS) and optical microscopy (OM) are utilized to characterize the evolution of damage pits with irradiation time. Experimental results describe that in the pre-damage stage of fused silica sample irradiated by 355-nm laser, the photothermal spectrum signal undergoes a process from scratch to metamorphism due to the absorption of laser energy by defects. During the visible damage stage of fused silica sample, the photothermal spectrum signal decreases gradually from the maximum value because of the aggravation of the damage and the splashing of the material. This method can be used to estimate the operation lifetime of optical elements in engineering.

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“…The detail of the apparatus is described in Ref. [24]. This method was used for measuring the on-line photothermal absorption signals of samples before and after laser irradiation damage.…”

Section: Photothermal Spectroscopy Measurementmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate*

Yan¹,

Liu²,

Li³

et al. 2020

Chinese Phys. B

Self Cite

View full text Add to dashboard Cite

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“…In recent years, photothermal spectroscopy is demonstrated to be a useful technique for the non-destructive characterization of fused silica optical components in high-power laser systems [22,23]. For example, Ju et al demonstrated the laser damage degree on fused silica surface can be indicated through combining photothermal spectroscopy and optical microscope [24]. Zhong et al utilized photothermal spectroscopy to characterize nanoscale damage precursors on plasma-etched fused silica surfaces [25,26].…”

Section: Introductionmentioning

confidence: 99%

Statistically Correlating Laser-Induced Damage Performance with Photothermal Absorption for Fused Silica Optics in a High-Power Laser System

et al. 2022

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Photothermal weak absorption is useful for the diagnosis of absorbing defects on the surface of fused silica optics in high-power lasers. However, how they relate to the laser-induced damage performance remains unclear, especially for a fused silica surface that has been post-treated with different processes (e.g., dynamic chemical etching or magnetorheological finishing). Here, we present a correlation study on the surface defect absorption level and laser-induced damage performance of fused silica optics post-treated with different processes using the photothermal common-path interferometer method. Statistical distribution of the absorbing defects at various absorption levels is obtained. The relationship between the defect density and the laser damage performance was analyzed. We show that the surface absorbing defects of fused silica can be affected by the post-treatment type and material removal amount. Furthermore, we show that the density of the defects with the absorption over 2 ppm is strongly correlated with the damage initiation threshold and damage density. Especially, for high-density defects at this absorption level, the damage density of fused silica optics can be well-predicted. In the low-density range, the density of this kind of defect can reflect the zero-probability damage threshold well. The study exhibits the potential of this methodology to non-destructively detect the key absorbing defects on fused silica surfaces as well as evaluate and optimize the post-treatment level of fused silica optics for high-power laser applications.

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“…Then, the small damage points can be repaired and the service life of components can be improved by 40% [ 15 ]. Therefore, to the ability to repair small damage points and inhibit their further growth quickly and effectively is critical to improving the optical performance of fused silica optical elements [ 17 ].…”

Section: Introductionmentioning

confidence: 99%

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method

et al. 2021

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The damage repair of fused silica based on the CO2 laser repair technique has been successfully applied in high-power laser systems in the controllable nuclear fusion field. However, this kind of repairing technique mainly focuses on large-scale laser damage with sizes larger than 200 μm, but ignores the influence of cluster small-scale damage with sizes smaller than 50 μm. In order to inhibit the growth of small-scale damage and further improve the effect of fused silica damage repair, this paper carried out a study on the repair of fused silica damage using the magnetorheological (MR) removing method. The feasibility of fused silica damage repairing was verified, and the evolution law of the number, morphology, and the surface roughness of small-scale damage were all analyzed. The results showed that the MR removing method was non-destructive compared to traditional repairing technologies. It not only effectively improved the whole damage repairing rate to more than 90%, but it also restored the optical properties and surface roughness of the damaged components in the repairing process. Based on the study of the MR removing repair law, a combined repairing process of 4 μm MR removal and 700 nm computer controlled optical surfacing (CCOS) removal is proposed. A typical fused silica element was experimentally repaired to verify the process parameters. The repairing rate of small-scale damage was up to 90.4%, and the surface roughness was restored to the level before repairing. The experimental results validate the effectiveness and feasibility of the combined repairing process. This work provides an effective method for the small-scale damage repairing of fused silica components.

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Photothermal spectroscopy study of fused silica irradiated by a 355 nm wavelength and 68 ns pulse duration laser

Cited by 5 publications

References 34 publications

Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate*

Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate*

Statistically Correlating Laser-Induced Damage Performance with Photothermal Absorption for Fused Silica Optics in a High-Power Laser System

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method

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