2006
DOI: 10.1002/app.23961
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Photopolymerization of a novel tetraoxaspiroundecane and silicon‐containing oxiranes

Abstract: New multifunctional silorane-based systems were investigated, with respect to their photoreactivity, as potential matrix resins for low-shrinkage/stress dental composites. The objective of this investigation was to synthesize and evaluate the reactivity of a silicon-analogue oxaspirocyclic monomer with silorane-based matrix resin systems during visible-light polymerization. The experimental formulations contained (1) a silicon-containing 1,5,7,11-tetraoxaspiro[5.5]undecane (TOSU-IV), (2) a phenylmethylsilane c… Show more

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Cited by 15 publications
(13 citation statements)
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“…The temperature curve observed in the present study implied that the cationic ring‐opening of Filtek LS has the so‐called frontal behavior, with the polymerization front of silorane functional monomers showing a very steep temperature profile 15 . The rapid rise in the heat that evolved up to a maximum followed by a slower rate of decline may be associated with an increased rate of “diffusion‐controlled termination reactions and reduced mobility of growing polymer chains.” 17 …”
Section: Discussionmentioning
confidence: 99%
“…The temperature curve observed in the present study implied that the cationic ring‐opening of Filtek LS has the so‐called frontal behavior, with the polymerization front of silorane functional monomers showing a very steep temperature profile 15 . The rapid rise in the heat that evolved up to a maximum followed by a slower rate of decline may be associated with an increased rate of “diffusion‐controlled termination reactions and reduced mobility of growing polymer chains.” 17 …”
Section: Discussionmentioning
confidence: 99%
“…The resin is a mixture of the diepoxides bis[2‐(7‐oxabicyclo[4.1.0]hept‐3‐yl)ethyl]methylphenylsilane 1 (BECEPSi, Scheme ) and the tetrafunctional cyclosiloxane epoxide 2,4,6,8‐tetrakis[2‐(7‐oxabicyclo[4.1.0]hept‐3‐yl)ethyl]‐2,4,6,8‐tetramethyl‐1,3,5,7‐tetraoxa‐2,4,6,8‐tetrasilacyclooctane (TECTMSi). In addition, it was found that the spiro monomer 3,9‐diethyl‐3,9‐bis(trimethylsilylpropoxymethyl)‐1,5,7,11‐tetraoxaspiro[5.5]undecane (TOSU) may significantly reduce the polymerization stress of these epoxide mixture 104–107. For the main monomer TECTMSi, the term “silorane” was introduced to represent hybrid monomer systems that contain both siloxane and oxirane structural units.…”
Section: Restorative Compositesmentioning
confidence: 99%
“…The acrylates, which undergo free‐radical polymerization, exhibit high reaction rates and offer a large selection of monomers and initiators. The epoxides and vinyl ethers, which undergo cationic polymerization, do not suffer from oxygen inhibition and exhibit low toxicity and shrinkage …”
Section: Introductionmentioning
confidence: 99%