Photonic band gap structures by sol–gel processing

Almeida, Rui M.; Portal, Sabine

doi:10.1016/s1359-0286(03)00045-7

Cited by 85 publications

(41 citation statements)

References 43 publications

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“…Although the sorption/partition of molecules takes place through complex mechanisms in these systems, our results indubitably prove that the optical response of functionalized ordered mesoporous multilayers can be advantageously used in detection of molecules with different physical and chemical properties (polarity, chirality, _). This also shows the advantage of having accessible controlled mesoporosity, as opposed to dense multilayer structures built using sol-gel methods [24] and because of the possibility of covering large-area substrates, it constitutes a valid alternative route to previously proposed porous silicon Bragg reflector sensing devices. [25] …”

Section: Tailoring the Optical Responsementioning

confidence: 99%

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Fuertes

López-Alcaraz

Marchi

et al. 2007

Adv Funct Materials

185

159

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Environment‐sensitive Bragg reflectors are built using functional mesoporous thin films as building blocks. Tuning of optical properties is achieved by changing the composition or porosity of the slabs or the introduction of planar defects. Sorption or capillary condensation of molecules into the pore system results in a 10–40 nm photonic bandgap (PBG) shift. Organic functions added to the pore surface change the response, permitting tailoring of the selectivity towards small‐size molecules.

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Section: Tailoring the Optical Responsementioning

confidence: 99%

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Fuertes

López-Alcaraz

Marchi

et al. 2007

Adv Funct Materials

185

159

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show abstract

“…Various simple planar deposition techniques such as sol-gel, r.f.-sputtering, holography etc. have been proposed [15][16][17][18]. Due to simple fabrication techniques, 1D PCs are cheap and effective to be used in various optoelectronic devices.…”

Section: Criterion Of Omnidirectional Reflection In One Dimensional Pmentioning

confidence: 99%

Structural Parameters in the Formation of Omnidirectional High Reflectors

Singh¹,

Pandey²,

Thapa³

et al. 2007

PIER

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Abstract-We investigate the structural parameters for the formation of omnidirectional photonic band gap in one dimensional photonic crystal. Simple transfer matrix method is used for calculations. The effect of two parameters, namely, refractive index contrast and filling fraction on omnidirectional reflection is investigated. We find from our study that when n L , n i , n s and d are fixed, omnidirectional bandgap increases with increasing n H /n L i.e., with increasing n H . Therefore, omnidirectional bandgap can be increased by using the material of high refractive index n H when the low index material n L is fixed. We also find that for the considered system of Si-SiO 2 , omnidirectional reflection range increases with filling fraction, goes to a maximum value and finally comes to zero. The maximum value of the omnidirectional reflection range is obtained at a value of 0.29 of the filling fraction. The range for allowable values of refractive index of ambient medium (n i ) has also been estimated.

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“…[10] On this basis, PECVD represents a preferred choice among the various liquid-and vapor-phase routes, thanks to the low temperature deposition of such materials at appreciable growth rates, and the possibility of obtaining homogeneous coatings and also sharp interfaces on complexly shaped substrates. [4,5,10,[12][13][14][15][16][17] Nevertheless, conventional processes involving the use of SiH 4 as a precursor suffer from several disadvantages. In fact, besides requiring the use of oxidizing reagents such as O 2 or N 2 O, the above compound has a high toxicity and reactivity.…”

Section: Introductionmentioning

confidence: 99%

Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films

Barreca

Gasparotto

Maccato

et al. 2007

Chemical Vapor Deposition

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Hybrid organic/inorganic SiO x C y H z thin films are prepared on Cu, Si(100), and SiO 2 substrates by plasma-enhanced (PE)CVD using tetramethoxysilane (TMOS) as the precursor compound. Depositions are performed from Ar plasmas at temperatures as low as 60°C, avoiding the use of oxidizing reagents in view of possible film application as protective coatings against substrate oxidation. In situ monitoring of deposition processes is performed using laser reflection interferometry (LRI), which provides valuable information on the growth rate as a function of the adopted synthesis conditions. The obtained film thickness values are confirmed by scanning electron microscopy (SEM), which is also used to investigate the film morphology and its adhesion to the substrate. The chemical structure and composition are investigated in detail by a combined use of energy dispersive X-ray spectroscopy (EDX), Fourier transform infrared (FTIR) spectroscopy, and X-ray photoelectron spectroscopy (XPS). Glancing incidence X-ray diffraction (GIXRD) and UV-vis spectroscopy are used for the study of the structural and optical properties of the system. Finally, nanoindentation measurements permit the evaluation of the hardness of the synthesized coatings. Amorphous layers with a silica-like network incorporating covalently bonded methyl and methoxy groups are obtained under very mild synthesis conditions. Furthermore, the coatings are characterized by good substrate conformal coverage and remarkable optical transparency.

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Photonic band gap structures by sol–gel processing

Cited by 85 publications

References 43 publications

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Structural Parameters in the Formation of Omnidirectional High Reflectors

Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films

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Photonic band gap structures by sol–gel processing

Cited by 85 publications

References 43 publications

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Photonic Crystals from Ordered Mesoporous Thin‐Film Functional Building Blocks

Structural Parameters in the Formation of Omnidirectional High Reflectors

Low‐Temperature PECVD of Transparent SiOxCyHz Thin Films

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Product

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Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films