2008
DOI: 10.1016/j.jlumin.2007.11.029
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Photoluminescence of Er-doped Si-SiO2 and Al–Si-SiO2 sputtered thin films

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Cited by 5 publications
(5 citation statements)
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“…For B5 this was estimated to be $9 Â 10 À17 cm 2 [53], in agreement with other calculated values [20], and for F3 it was estimated to be $9 Â 10 À18 cm 2 [21]. By comparing the emission 4 I 13/2 -4 I 15/2 spectrum of G6 with those of B5 and F3 as shown in Fig.…”
Section: Article In Presssupporting
confidence: 87%
See 1 more Smart Citation
“…For B5 this was estimated to be $9 Â 10 À17 cm 2 [53], in agreement with other calculated values [20], and for F3 it was estimated to be $9 Â 10 À18 cm 2 [21]. By comparing the emission 4 I 13/2 -4 I 15/2 spectrum of G6 with those of B5 and F3 as shown in Fig.…”
Section: Article In Presssupporting
confidence: 87%
“…It was already mentioned [21,36] that the Er ions in the FX samples are excited both by the defects and by the Si np present in these films. Nonradiative energy transfer from the ZrO 2 host to RE ions has been previously reported [34,53]. For the FX and GX samples this nonradiative energy transfer from the host comes from the defects; in this case we have to mention the V-type center (holes trapped at an oxygen ion adjacent to a cation vacancy) defects in YSZ [35], which have an absorption band around 465 nm and are excited when using the 457.9 nm laser line.…”
Section: Article In Pressmentioning
confidence: 81%
“…The development of optoelectronic devices is largely dependent on advances in thin-film deposition technology. Techniques employed to achieve the deposition of lanthanidedoped upconversion thin films can be broadly classified into chemical vapor deposition and physical vapor deposition, including sputtering [36,37], pulsed-laser deposition (PLD) [38][39][40][41][42], molecular beam epitaxy (MBE) [43,44], sol-gel procedure [45][46][47], thermal evaporation [48], and atomic layer deposition (ALD) [49]. Luminescent materials based on thin films have several advantages over conventional nanocrystals in optoelectronic applications such as excellent thermal stability and outstanding adhesion to solid substrates.…”
Section: Thin Filmsmentioning
confidence: 99%
“…The emission properties depend not only on ZnO host structures such as nanoparticles, nanocrystals, nanorods, films, but also on impurities in the host such as Li [10], Ti, Co, Ni, Mn, Fe [6] etc. Enhancement of Er luminescence from the Er-doped Al-Si-SiO 2 thin films [11] has been studied. Red lighting Eu 3+ and green lighting Tb 3+ ions are often doped in the ZnO materials.…”
Section: Introductionmentioning
confidence: 99%