Summary: The communication provides a novel and alternative route to generate chemically tethered binary polymer‐brush pattern through two‐step surface‐initiated atomic‐transfer radical polymerization (SI‐ATRP). Polymer brush‐1 was prepared by SI‐ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush‐2 was grown.Schematic representation of the resultant binary polymer brush patterns.imageSchematic representation of the resultant binary polymer brush patterns.