1999
DOI: 10.1016/s0928-4931(99)00080-6
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Photolithographic structuring of surface-attached polymer monolayers

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Cited by 44 publications
(48 citation statements)
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“…This was realized by transforming the Br end group to an azide end group, making use of the reaction with sodium azide in DMF. [11] This end group transformation was verified by the corresponding XPS spectra ( Figure 1A) and ATR-FTIR spectra ( Figure 1B). Namely, the complete disappearance of the Br signals in the XPS spectra and the appearance of the azide peak at 2 124 cm À1 in the ATR-FTIR spectra after derivatization demonstrated the complete transformation of the bromo group into the azide group.…”
Section: Resultsmentioning
confidence: 58%
See 1 more Smart Citation
“…This was realized by transforming the Br end group to an azide end group, making use of the reaction with sodium azide in DMF. [11] This end group transformation was verified by the corresponding XPS spectra ( Figure 1A) and ATR-FTIR spectra ( Figure 1B). Namely, the complete disappearance of the Br signals in the XPS spectra and the appearance of the azide peak at 2 124 cm À1 in the ATR-FTIR spectra after derivatization demonstrated the complete transformation of the bromo group into the azide group.…”
Section: Resultsmentioning
confidence: 58%
“…[10] Unfortunately, the post photolithographic technique is only applicable to some light-sensitive polymers. In addition, although Rühe and co-workers [11] Summary: The communication provides a novel and alternative route to generate chemically tethered binary polymerbrush pattern through two-step surface-initiated atomictransfer radical polymerization (SI-ATRP). Polymer brush-1 was prepared by SI-ATRP, passivated by a reaction with NaN 3 , and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush-2 was grown.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, Rühe has used photoinitiation to pattern both silicon and gold substrates. [66,67] Furthermore, our group is developing new photoinitiators for improved control over pattern resolution and processing with a variety of monomers. [68±70] The most successful photo-SIPs have been based on AIBN.…”
Section: Polymerization Of Vinyl Acrylate and Other Monomersmentioning
confidence: 99%
“…This approach can be used for photopatterning. 29 Two different methods of patterning the polymer film were used in our study, resulting in either negative or positive resist images. When a TEM grid ͑mask͒ was placed over an immobilized initiator film that was immersed in a monomer solution and irradiated using UV light, highly reactive radicals were formed only in the exposed areas; these radicals initiated polymer growth.…”
Section: B Patterning the Polymer Layermentioning
confidence: 99%