The first general method for the Pd-catalyzed amination of aryl tosylates and benzenesulfonates was developed utilizing ligand 1, which belongs to a new generation of biaryl monophosphine ligands. In addition, the new catalyst system for the first time enables amidation of aryl arenesulfonates and aqueous amination protocols that do not necessitate the use of cosolvents. The substrate scope has been significantly expanded to include aryl halides containing primary amides and free carboxylic acid groups. In the case of multifunctional substrates, the Pd-catalyzed amination can provide selectivity that is complementary to the Cu-catalyzed C-N bond-forming processes.

[reaction: see text] A general and efficient copper-catalyzed method for the amidation of vinyl bromides and iodides has been developed. This protocol uses a combination of 5 mol % copper iodide and 20 mol % N,N'-dimethyl ethylenediamine. Substrates bearing ester, silyl ether, and amino groups were successfully coupled under the reaction conditions. The double bond geometry of the vinyl halides was retained under the reaction conditions.

A general method for the coupling of aryl and vinyl halides with diaryl and dialkyl phosphines, as well as with dibutyl phosphite, is reported. This highly efficient transformation is realized through the use of copper(I) iodide as a catalyst, N,N'-dimethylethylenediamine as a ligand, and Cs(2)CO(3) as a base. A variety of sterically hindered and/or functionalized substrates were found to react under these reaction conditions to provide products in good to excellent yields. [reaction: see text]

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Summary: The communication provides a novel and alternative route to generate chemically tethered binary polymer‐brush pattern through two‐step surface‐initiated atomic‐transfer radical polymerization (SI‐ATRP). Polymer brush‐1 was prepared by SI‐ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush‐2 was grown.Schematic representation of the resultant binary polymer brush patterns.imageSchematic representation of the resultant binary polymer brush patterns.

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