2004
DOI: 10.1063/1.1753076
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Photoionization cross-section analysis for a deep trap contributing to current collapse in GaN field-effect transistors

Abstract: Articles you may be interested inPhysics-based simulation of buffer-trapping effects on slow current transients and current collapse in GaN field effect transistors J. Appl. Phys. 98, 124502 (2005); 10.1063/1.2141653 Response to "Comment on 'Carrier trapping and current collapse mechanism in GaN metal-semiconductor field effect transistors'" [Appl. Phys. Lett.86, 016101 (2005)] Appl. Phys. Lett. 86, 016102 (2005); 10.1063/1.1844604Carrier trapping and current collapse mechanism in GaN metal-semiconductor field… Show more

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Cited by 66 publications
(48 citation statements)
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“…7 Correcting e o (hm) for the incident photon flux determines the spectral dependence of the deep-level optical cross-section (r o ). Fitting r o (hm) to an appropriate model 13 that accounts for lattice coupling of the deep-level defect yields values for the optical ionization energy (E o ) and Franck-Condon shift (d FC ). Values of the fitted parameters were robust to changes in the fitted data range (yielding less than 50 meV variation), as long as the threshold and saturation regions were included.…”
Section: Methodsmentioning
confidence: 99%
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“…7 Correcting e o (hm) for the incident photon flux determines the spectral dependence of the deep-level optical cross-section (r o ). Fitting r o (hm) to an appropriate model 13 that accounts for lattice coupling of the deep-level defect yields values for the optical ionization energy (E o ) and Franck-Condon shift (d FC ). Values of the fitted parameters were robust to changes in the fitted data range (yielding less than 50 meV variation), as long as the threshold and saturation regions were included.…”
Section: Methodsmentioning
confidence: 99%
“…Focusing first on the hm > 3.30 eV range, saturations in the spectra at 3.36 eV and 3.40 eV mark the In 0.02 Ga 0.98 N and p-GaN:Mg band edge, respectively. The 3.36 eV and 3.40 eV band edges were also weakly evident for DLOS of sample A measured at 0 V. The two DLOS onsets near 1.70 eV and 2.50 eV for the À2 V DLOS spectrum were fitted to the same theoretical model 13 as before to extract E o = 1.85 eV and 2.51 eV, respectively. The E v + 1.85 eV and E v + 2.51 eV levels exhibited thresholds that were red-shifted relative to their respective E o , indicating significant d FC values.…”
Section: Optical Spectroscopy Of Defectsmentioning
confidence: 99%
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“…The symbols are data and the lines are fits to the models of Lucovksy 11 or Pässler. 12 The data were offset for clarity since relative spectral variations of the DLOS spectra are sufficient to characterize the defect states. Note that DLOS measures deep level energy but does not quantify N t ; N t measurement is discussed later.…”
Section: Study Of the Impact Of Point Defects In Alganmentioning
confidence: 99%
“…[8] for different types of defects in Si and Ge, and in Refs. [9] and [10] for some deep levels in compound semiconductors. In particular Ref.…”
mentioning
confidence: 99%