2011
DOI: 10.1063/1.3562151
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Photoemission spectroscopy study of oxygen spectrum and the chemical failure process of Alq3-based light-emitting devices

Abstract: Tris (8-hydroxyquinolino) aluminum (Alq3) films and their chemical failure process are investigated using x-ray photoelectron spectroscopy. We make sure that the O 1s spectrum of the pristine Alq3 only has one component which is in contrast to the current controversy on this issue. Our experiments further indicate that the chemical failure process of Alq3 holds the critical role to understand this problem. The chemical failure process also shows the organic carbon contamination and the replacement reaction bet… Show more

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Cited by 4 publications
(1 citation statement)
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“…The XPS was measured to explore the charge transfer at the m-MTDATA/Alq 3 interface [23][24][25][26]. The XPS results of m-MTDATA-doped Alq 3 films, as well as the pure MTDATA, Alq 3 films are represented in figure 2(a) and the thickness of all these films is 80 nm.…”
Section: Resultsmentioning
confidence: 99%
“…The XPS was measured to explore the charge transfer at the m-MTDATA/Alq 3 interface [23][24][25][26]. The XPS results of m-MTDATA-doped Alq 3 films, as well as the pure MTDATA, Alq 3 films are represented in figure 2(a) and the thickness of all these films is 80 nm.…”
Section: Resultsmentioning
confidence: 99%