2016
DOI: 10.1038/ncomms13399
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Photoemission-based microelectronic devices

Abstract: The vast majority of modern microelectronic devices rely on carriers within semiconductors due to their integrability. Therefore, the performance of these devices is limited due to natural semiconductor properties such as band gap and electron velocity. Replacing the semiconductor channel in conventional microelectronic devices with a gas or vacuum channel may scale their speed, wavelength and power beyond what is available today. However, liberating electrons into gas/vacuum in a practical microelectronic dev… Show more

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Cited by 50 publications
(43 citation statements)
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References 44 publications
(67 reference statements)
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“…The surface area of the photocathode is around 450 µ m (22 by 22 unit cells with the area of about 1 by 1 micron), and the minimum gap size is 100 nm. As reported in gold (see [6,32]).…”
Section: Photoemission By Resonant Photocathodesmentioning
confidence: 55%
See 1 more Smart Citation
“…The surface area of the photocathode is around 450 µ m (22 by 22 unit cells with the area of about 1 by 1 micron), and the minimum gap size is 100 nm. As reported in gold (see [6,32]).…”
Section: Photoemission By Resonant Photocathodesmentioning
confidence: 55%
“…Comparing the the experimental values reported in [6] with Fig. 8, either a higher field enhancement factor (for the static or the laser field) should be considered, or the thermal effect is considerable.…”
Section: Log(j λ +J Gtf ) [A/cm 2 ]mentioning
confidence: 87%
“…A 40x40 layout of the periodic unit-cells was fabricated on silicon wafers with a 280 nm thermally grown SiO2 layer to minimize leakage currents through substrate. The silicon wafers had a resistivity above 10000 Ω.cm and the thickness of SiO2 layer is sufficient for proper isolation [21]. We do not expect thermal expansion in our experiment since the electrodes are mechanically coupled to the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…], LW is attractive for light-matter interaction and chiral quantum processes [21,36]). Moreover, the significant field enhancement and the available air channel at the interface-line can potentially offer simple implementation for micro-plasma and vacuumbased electronic devices [47]. Furthermore, the adopted effective-medium approach allows for forming LWs with reconfigurable pathways [48,40].…”
mentioning
confidence: 99%