2007
DOI: 10.1002/app.27436
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Photocure properties of high‐heat‐resistant photoreactive polymers with cinnamate groups

Abstract: New high-heat-resistant photoreactive polymers with cinnamate groups were synthesized by the reaction of cinnamic acid (CA) and epoxy resins. Their photocure properties were investigated with Fourier transform infrared spectroscopy, UV-visible spectroscopy, and thermogravimetric analysis (TGA). Their photocure reaction rates and the extent of reaction conversion increased with the intensity of UV irradiation. To investigate their photocure reaction kinetics, their reaction conversion rates were plotted against… Show more

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Cited by 26 publications
(16 citation statements)
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(27 reference statements)
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“…Along with this fact, however, an intermolecular interaction of the СС bonds of the active solvent or DAAD with the NH groups of m ‐PA with the formation of the grafted copolymers was possible. It needs to note that the maximal thermal stability of the obtained materials in air exceed the analogous characteristic (about 250 °C) of a cured PPC (in the form of the cast films) based on end‐capped aromatic diglycidyl ethers and cinnamate esters of polyphenylenes with the bridge aliphatic groups …”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Along with this fact, however, an intermolecular interaction of the СС bonds of the active solvent or DAAD with the NH groups of m ‐PA with the formation of the grafted copolymers was possible. It needs to note that the maximal thermal stability of the obtained materials in air exceed the analogous characteristic (about 250 °C) of a cured PPC (in the form of the cast films) based on end‐capped aromatic diglycidyl ethers and cinnamate esters of polyphenylenes with the bridge aliphatic groups …”
Section: Resultsmentioning
confidence: 99%
“…It needs to note that the maximal thermal stability of the obtained materials in air exceed the analogous characteristic (about 250 8C) of a cured PPC (in the form of the cast films) based on end-capped aromatic diglycidyl ethers and cinnamate esters of polyphenylenes with the bridge aliphatic groups. 31…”
Section: Characterization Of the Photo Crosslinked Materialsmentioning
confidence: 99%
“…Phenomenological relations may be found in the literature for the evolution of α . The evolution of α while the second network forming is given by trueα̇=kf(1α)n where k f is the rate constant of the forward reaction and n is the order of the reaction.…”
Section: Continuum Framework and Model Summarymentioning
confidence: 99%
“…Phenomenological forms. Phenomenological relations may be found in the literature ( [29,44]) for the evolution of˛. The evolution of˛while the second network forming is given by…”
Section: Photochemical Constitutive Behaviormentioning
confidence: 99%
“…The most significant challenges have been in the area of improving the thermal resistance, transparency, and cost effectiveness of CF resists for color patterning, because the pigment dispersion method, which is the widely used CF manufacturing process, requires these properties. [2][3][4] In previous reports, 5,6 new methacrylate-type pre-polymers including a cyclohexane moiety and biphenyl group, and new cinnamate-type photoreactive pre-polymers with a cyclopentadiene moiety and various aromatic groups were synthesized in order to improve the heat resistance and transparency of photopolymer systems.…”
Section: Introductionmentioning
confidence: 99%