2010
DOI: 10.1007/s12648-010-0147-3
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Photoconductivity and photoluminescence in chemically deposited films of (Cd0.95-Pb0.05)S: CdCl2,Ce

Abstract: The results of photoconductivity (PC), photoluminescence (PL), optical absorption spectra, XRD and SEM studies are presented for (Cd 0.95 -Pb 0.05 )S : CdCl 2 ,Ce films prepared by chemical bath deposition technique. PC gains ~10 7 are found in doped films. PL emission spectrum is found in red region which is related to 5d to 4f transition in Ce. Films prepared at 60°C show better PC while those prepared at room temperature (RT) show better PL. Optical absorption studies show reduction in band gap due to addit… Show more

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Cited by 11 publications
(2 citation statements)
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“…For preparation of films, many techniques have been used including vapor cooling condensation method [18], magnetron sputtering [3,13], chemical bath deposition [19], metal organic chemical vapour deposition (MOCVD) [20], spray pyrolysis [21], plasma-assisted molecular beam epitaxy (PA-MBE) [22,23], reactive electron beam (ebeam) evaporation system [24], dielectric barrier discharged pulsed laser deposition (DBD-PLD) [25], filtered vacuum (cathodic) arc deposition (FVAD, FCVD) [26,27], spin coating method [14], sputtering [15] etc. Pulsed filtered cathodic vacuum arc deposition (PFCVAD) is a common technique to prepare oxide and removal of macroparticles in arc evaporation.…”
Section: Introductionmentioning
confidence: 99%
“…For preparation of films, many techniques have been used including vapor cooling condensation method [18], magnetron sputtering [3,13], chemical bath deposition [19], metal organic chemical vapour deposition (MOCVD) [20], spray pyrolysis [21], plasma-assisted molecular beam epitaxy (PA-MBE) [22,23], reactive electron beam (ebeam) evaporation system [24], dielectric barrier discharged pulsed laser deposition (DBD-PLD) [25], filtered vacuum (cathodic) arc deposition (FVAD, FCVD) [26,27], spin coating method [14], sputtering [15] etc. Pulsed filtered cathodic vacuum arc deposition (PFCVAD) is a common technique to prepare oxide and removal of macroparticles in arc evaporation.…”
Section: Introductionmentioning
confidence: 99%
“…The structural parameters such as crystallinity, crystal phase, lattice constant, grain size etc. are strongly dependent on the deposition conditions [7]. A crystal structure and symmetry play important roles in determining many of its properties, such as cleavage, electronic band structure, and optical properties.…”
Section: Introductionmentioning
confidence: 99%