Photochemical Surface Modification of Silicone Rubber into Photoluminescent Material by 193 nm ArF Excimer Laser Irradiation

Abstract

A transparent, flexible silicone rubber ([SiO(CH3)2]n) surface was photochemically modified into a photoluminescent material using a 193 nm ArF excimer laser. The photomodified silicone rubber emitted white light under a 325 nm He–Cd laser or a 375 nm light-emitting diode. The chemical bonding of the photomodified silicone rubber was found to be similar to that of a silica-like silicone, as analyzed by Fourier-transform infrared spectroscopy and X-ray photoelectron spectroscopy. The photoluminescence of the rubber originated from oxygen deficiency centers and peroxy centers of the silica structure in the photomodified silicone rubber. Fine particles 200 nm in diameter were also formed in the photomodified silicone rubber to enhance the intensity of the photoluminescence.

F2-laser-induced surface modification of iron thin films to obtain corrosion resistance

“…This work is based on our previous finding; i.e., silicone ([SiO(CH 3 ) 2 ] n ) rubber is photochemically modified into carbon-free silica (SiO 2 ) by F 2 laser irradiation. [11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] The use of the F 2 laser is essential for accomplishing the photochemical reactions; active oxygen [O( 1 D)] atoms can be effectively obtained through the photodecomposition of O 2 molecules in air. The strong oxidation reaction can take place on the silicone rubber surface with the O( 1 D) atoms.…”

Fs-laser processing of polydimethylsiloxane

“…5,6 The use of laser radiation offers a useful approach to the processing and selective surface functionalization of silicone. In particular, UV nanosecond laser pulses (e.g., KrF, ArF, and F 2 ) are largely applied for fabrication of optical elements, 7-9 deposition of thin films, 10-12 modification of optical properties, [13][14][15] and surface processing or functionalization. [16][17][18][19][20][21][22] For example, KrF excimer laser (k ¼ 248 nm) processing of siloxane-based flexible silicone rubber is used to photo-decompose the sample surface changing the surface relief.…”

Photochemical Micro-/Nano-Swelling of Silicone Rubber Induced by Long Pulse-Repetition Interval of an ArF Excimer Laser

“…After the laser irradiation, the photochemical micro-/nano-swelling of the silicone rubber was photochemically welded to each silica glass microsphere [14] because an extremely thin layer of the micro-/nano-swelling may be photochemically modified into a silica-like silicone during laser irradiation [25]. Thus, to remove the microspheres, a 1 wt % HF chemical etching was required.…”

“…silica-like silicone during laser irradiation [25]. Thus, to remove the microspheres, a 1 wt % HF chemical etching was required.…”

“…Figure 1 shows the top view of the SEM images of the aligned silica glass microspheres on silicone rubber after the HF chemical etching for 0, 15, 30, 60, and 90 s. For reference, an oblique view of the SEM images is also shown in Figure 2. silica-like silicone during laser irradiation [25]. Thus, to remove the microspheres, a 1 wt % HF chemical etching was required.…”