2010
DOI: 10.1007/s10800-010-0091-0
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Photoactive WO3 and Se-WO3 thin films for photoelectrochemical oxidation of organic compounds

Abstract: Thin films of bare and Se-containing tungsten trioxide (WO 3 ) on AISI304-type stainless steel were prepared by electrochemical deposition using peroxy-tungstate solutions. The obtained films were characterized by X-ray diffraction, photoelectron spectroscopy, scanning electron microscopy, thermal and photovoltammetry analyses. The oxidation of methylene blue, phenol, and methanol was used to evaluate the photoelectrocatalytic activity of the prepared films. It has been established that the incident photon-to-… Show more

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Cited by 7 publications
(3 citation statements)
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“…Photocatalytic decomposition of organic pollutants and production of clean hydrogen fuel can take place simultaneously when the pollutants are acted as electron donors [31,32]. Li et.…”
Section: Simultaneous Photodegradation Of Organic Pollutantsmentioning
confidence: 99%
“…Photocatalytic decomposition of organic pollutants and production of clean hydrogen fuel can take place simultaneously when the pollutants are acted as electron donors [31,32]. Li et.…”
Section: Simultaneous Photodegradation Of Organic Pollutantsmentioning
confidence: 99%
“…The electrons from this oxidation reaction can reduce protons to hydrogen molecules in a process known as nonstoichiometric water splitting (as shown in Scheme ). Photocatalytic decomposition of organic pollutants and production of clean hydrogen fuel can take place simultaneously when the pollutants are acting as electron donors. , Li et al reported enhanced photocatalytic hydrogen production using aqueous Pt/TiO 2 suspension in the presence of pollutants such as formic acid and formaldehyde, which act as electron donors . Despite the limited work on using pollutants as electron donors, the encouraging results show the promise of the integration of pollutant decomposition and clean hydrogen production.…”
Section: Resultsmentioning
confidence: 99%
“…The backside of the wafer was deposited with an aluminum layer to form the ohmic contact. 28,29 The SiO 2 component is from the interface layer (IL) formed between the WO 3 film and the Si substrate. The bulk-and interface-layer structures were examined with the high resolution transmission electron spectroscopy a) Electronic mail: yuekuo@tamu.edu (HRTEM).…”
Section: Methodsmentioning
confidence: 99%