2001
DOI: 10.1016/s0925-9635(00)00542-2
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Phosphorus doping and defect studies of diamond-like carbon films by pulsed laser deposition using camphoric carbon target

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Cited by 29 publications
(19 citation statements)
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“…The laser pulse energy was 150 mJ on the window. Details of the chemical structure of the starting precursor (C 10 H 16 O), the C 10 H 16 O burning system and the target preparation method have been described elsewhere [4]. In brief, C 10 H 16 O was burnt in a quartz tube and the soot deposited along the walls of the tube was collected, dried in the oven for an hour and pressed into pellets in order to use them as targets in PLD.…”
Section: Methodsmentioning
confidence: 99%
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“…The laser pulse energy was 150 mJ on the window. Details of the chemical structure of the starting precursor (C 10 H 16 O), the C 10 H 16 O burning system and the target preparation method have been described elsewhere [4]. In brief, C 10 H 16 O was burnt in a quartz tube and the soot deposited along the walls of the tube was collected, dried in the oven for an hour and pressed into pellets in order to use them as targets in PLD.…”
Section: Methodsmentioning
confidence: 99%
“…Graphite is the most common solid target used in physical vapour deposition methods for carbon films. We have been working on semiconducting carbon, obtained from camphor (C 10 H 16 O), a natural source [1,4,5]. The starting precursor, C 10 H 16 O, has both sp 2 and sp 3 hybridized bonds while graphite has 100% sp 2 bonded structure.…”
Section: Introductionmentioning
confidence: 99%
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“…The laser pulse energy was 150 mJ on the window. In order to dope, the camphoric carbon (CC) soot was mixed with various amount of red phosphorus [9] or boron [10] and compressed into pellets.…”
Section: Amorphous Carbon Film Prepared From Camphormentioning
confidence: 99%
“…Previously, phosphorus-doped carbon films were mainly fabricated by vapor deposition techniques, such as plasma immersion ion implantation and deposition [13], capacitively coupled radio frequency plasma deposition [14], filtered cathodic arc method [10], pulsed laser deposition [15], etc. However, the process using electrochemical deposition was particularly interesting.…”
Section: Introductionmentioning
confidence: 99%