Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer

Hlubina, Petr; Ciprián, Dalibor; Luňáček, Jiří; Chlebus, R.

doi:10.1007/s00340-007-2709-4

Cited by 15 publications

(29 citation statements)

References 13 publications

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“…The correlation coefficients R N LP indicate minimum discrepancy between the real structure and the theoretical model adopted. As can be deduced from the comparison of the results with those presented in a previous paper [12], the agreement is achieved by minimizing the systematic phase errors that are due to the optical components present in the interferometer. The correlation coefficients R R show that the best agreement is reached for the first sample and the worst for the fourth one.…”

Section: Resultssupporting

confidence: 59%

“…It results from previous papers [11,12] that the spectral interferograms recorded in the mentioned experimental set-up can be used to measure the absolute OPD ∆(λ), from which we can construct the nonlinear-like phase function δ(λ) for a chosen mirror position L = L 0 . Under the assumption δ BS (λ) = 0 Eq.…”

Section: Methods Of Spectral Interferometrymentioning

confidence: 99%

“…We showed [11,12] that the oscillatory part of phase change on reflection (interferometric phase) from the thin-film structure, which is referred to the nonlinearlike phase function and which is similar to the nonlinear phase function φ nl (λ), can be retrieved from the spectral interferograms recorded in the experimental set-up shown in Fig. 1.…”

Section: Theoretical Backgroundmentioning

confidence: 98%

“…The thickness of the thin film is determined from the fit of the recorded spectral interferogram to the theoretical one. More recently, the use of dispersive white-light spectral interferometry was extended for measuring thin film thickness utilizing the absolute phase retrieval from the spectral interferogram [11,12]. However, the results suffer from the systematic phase errors due to the optical components present in the interferometer.…”

Section: Introductionmentioning

confidence: 99%

“…In this paper, we present a new method for a precise measurement of the interferometric phase (nonlinearlike phase [11,12]) of a thin-film structure. The method is based on white-light spectral interferometry and is combined with reflectometry.…”

Section: Introductionmentioning

confidence: 99%

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Spectral interferometry and reflectometry used to measure thin films

et al. 2008

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A new method for a precise measurement of the oscillatory part of phase change on reflection (interferometric phase) from a thin-film structure is presented. The method, which is based on phase retrieval from the spectral interferograms recorded at the output of a slightly dispersive Michelson interferometer, is combined with reflectometry. The interferometric phase of the thin-film structure is measured precisely using a reference sample of known phase change on reflection. The spectral reflectance of the thin-film structure is also measured in the interferometer. The feasibility of the method is confirmed in processing the experimental data for SiO 2 thin film on a silicon wafer of known optical constants. Four samples of the thin film are used and their thicknesses are determined. We confirm very good agreement between the thicknesses obtained from the interferometric phase and reflectance measurements.

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Section: Resultssupporting

confidence: 59%

Section: Methods Of Spectral Interferometrymentioning

confidence: 99%

Section: Theoretical Backgroundmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Spectral interferometry and reflectometry used to measure thin films

et al. 2008

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Wavelength correction for thin film measurement in a microscopic white light spectral interferometer

Guo

Zhou

et al. 2017

Optik

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Windowed Fourier transform applied in the wavelength domain to process the spectral interference signals

Hlubina

Luňáček

Ciprián

et al. 2008

Optics Communications

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We report on processing the spectral interference signals by a new method based on a windowed Fourier transform applied in the wavelength domain. First, the numerical simulations are performed to demonstrate high precision of the phase retrieval from the spectral signal. Second, the feasibility of the method is confirmed in processing experimental data from a dispersive Michelson interferometer comprising a cube beamsplitter made of BK7 glass. From the retrieved spectral phase difference, the effective thickness of the beamsplitter is determined precisely.

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Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer

Cited by 15 publications

References 13 publications

Spectral interferometry and reflectometry used to measure thin films

Spectral interferometry and reflectometry used to measure thin films

Wavelength correction for thin film measurement in a microscopic white light spectral interferometer

Windowed Fourier transform applied in the wavelength domain to process the spectral interference signals

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