2010
DOI: 10.1103/physrevb.81.113403
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Phase formation in iron silicide nanodots grown by reactive deposition epitaxy on Si(111)

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Cited by 6 publications
(2 citation statements)
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“…The samples were grown by depositing a certain amount of iron θ F e onto the Si(111) substrate heated to the growth temperature T G , a process known as reactive deposition epitaxy (RDE), which is commonly used for the growth of iron silicide nanostructures (e.g. [10,15,[60][61][62][63]). Six samples, hereinafter referred to as S1-S6, were prepared, characterized and investigated.…”
Section: Methodsmentioning
confidence: 99%
“…The samples were grown by depositing a certain amount of iron θ F e onto the Si(111) substrate heated to the growth temperature T G , a process known as reactive deposition epitaxy (RDE), which is commonly used for the growth of iron silicide nanostructures (e.g. [10,15,[60][61][62][63]). Six samples, hereinafter referred to as S1-S6, were prepared, characterized and investigated.…”
Section: Methodsmentioning
confidence: 99%
“…For example, Fe 3 Si is ferromagnetic and is a promising candidate as spin injectors in future spintronic devices such as magnetic tunnel junctions [ 6 ]. β -FeSi 2 is semiconducting with a direct band gap of approximately 0.85 eV, which fits into the window of maximum transmission of optical fibers and is expected to be a suitable material for optoelectronic devices such as light detectors or near-infrared sources [ 2 , 7 ]. In addition to the above stable compounds, metastable iron silicide phases which do not exist in the bulk phase diagram can also be grown and stabilized on silicon surfaces by epitaxy due to the enhanced surface energy of thin films.…”
Section: Introductionmentioning
confidence: 99%