2003
DOI: 10.1016/s0257-8972(02)00670-9
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Phase depth distribution characteristics of the plasma nitrided layer on AISI 304 stainless steel

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Cited by 57 publications
(25 citation statements)
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“…The strain resulting from high nitrogen contents is believed to responsible for the formation of the slip bands in the c N layer. This finding agrees quite well with an earlier study, in which 304 SS was plasma nitrided at 400°C by a low-pressure plasma arc-source ion nitriding method [17]. This study concluded that a high slip band density can be observed on the nitrided surface when the strain resulting from nitrogen supersaturation is great enough to activate the primary {1 1 1} slip system.…”
Section: Resultssupporting
confidence: 92%
“…The strain resulting from high nitrogen contents is believed to responsible for the formation of the slip bands in the c N layer. This finding agrees quite well with an earlier study, in which 304 SS was plasma nitrided at 400°C by a low-pressure plasma arc-source ion nitriding method [17]. This study concluded that a high slip band density can be observed on the nitrided surface when the strain resulting from nitrogen supersaturation is great enough to activate the primary {1 1 1} slip system.…”
Section: Resultssupporting
confidence: 92%
“…The well known plasma nitriding (PN) technique is used to improve its mechanical, tribological, corrosion resistance, biocompatibility and life expectancy (Bordji et al, 1996, Xu et al, 2003. The PN technique produces Fe 3 N, Fe 4 N, Cr 2 N and mainly a metastable phase of supersaturating nitrogen in the austenite phase e.g., the expanded austenite, γ N phase (Tromas et ).…”
Section: Introductionmentioning
confidence: 99%
“…However, despite numerous investigations, the structure and formation of this phase is not completely understood. These results are promising in view of industrial applications, because this treatment on austenitic stainless steel can be performed with techniques using less energetic ions [9][10][11][12] such as low-energy high current density ion implantation [13,14]. Using high current density, it is possible to obtain nitrided layers several micrometers thick.…”
Section: Introductionmentioning
confidence: 99%