2014
DOI: 10.1021/ma501126t
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Phase Behavior of Poly(4-hydroxystyrene-block-styrene) Synthesized by Living Anionic Polymerization of an Acetal Protected Monomer

Abstract: We have synthesized a series of poly(4-(2-tetrahydropyranyloxy)styrene) [P(OTHPSt)] homopolymers by living anionic polymerization of the protected monomer (OTHPSt) in tetrahydrofuran at −78 °C, with excellent control over molecular weight and dispersity. The high T g of P(OTHPSt) led to facile purification and isolation of the polymer as a powder. Characterization of the POTHPSt homopolymer by nuclear Overhauser effect spectroscopy confirms the strong preference for the axial position of the relatively sterica… Show more

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Cited by 38 publications
(70 citation statements)
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“…This broad peak is present in the scattering pattern of X#P ON as well as in P and is therefore not a characteristic of the network. The presence of such a peak is well known for concentrated polymer systems that display micro-phase separation such as block copolymers in the amorphous state [28,29]. The underlying physical effect is referred to as "correlation-hole" effect.…”
Section: Scattering Contributionmentioning
confidence: 99%
“…This broad peak is present in the scattering pattern of X#P ON as well as in P and is therefore not a characteristic of the network. The presence of such a peak is well known for concentrated polymer systems that display micro-phase separation such as block copolymers in the amorphous state [28,29]. The underlying physical effect is referred to as "correlation-hole" effect.…”
Section: Scattering Contributionmentioning
confidence: 99%
“…The Flory--Huggins interaction parameter is !"/! "# = 0.124 43 . The morphology of symmetric ABA triblock copolymers has been examined by self--consistent field theory.…”
Section: Please Do Not Adjust Margins Please Do Not Adjust Marginsmentioning
confidence: 99%
“…As a result, P(4HS-b-S) can form self-assembled lamellae with periodicities (L 0 ) as small as 12 nm, which is about a factor of 2 smaller than the minimum periodicities achievable with P(S-b-MMA). 29 Furthermore, the modification of the phenolic group to introduce metal or oxide precursors can result in a robust hard mask that can be used for subsequent pattern transfer to the underlying substrate. By utilizing protected or deprotected phenol groups, a variety of nanopatterning strategies that combine top-down and bottom-up approaches are possible.…”
mentioning
confidence: 99%
“…29 In order to make the copolymer chains mobile to rapidly drive the assembly process within several minutes, typically annealing at temperatures far above T g is required. For example, annealing P(S-b-MMA) thin film at temperatures higher than T g + 120°C is required for complete assembly within 5 min.…”
mentioning
confidence: 99%
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