Phase and amplitude apodization induced by focusing through an evanescent gap in a solid immersion lens microscope

Jo, Joshua S.; Milster, Tom D.; Erwin, J. Kevin

doi:10.1117/1.1485999

Cited by 13 publications

(10 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…From previous researches for the gap induced aberration in a near-field imaging system, we know there are (Zijp et al 2004;Jo et al 2002). Therefore, we analyze the effect of the gap induced aberration by considering a classical multiple beam interference in a three-layer system consisting of a SIL, air gap, and a cover-layer.…”

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

“…Also, Fresnel's transmission coefficient is defined as t ij = 1 + r ij for the two polarization directions. From Jo et al (2002), it is known that each C 0 vector indicates symmetric aberration, defocus and spherical aberration, and C 1 vector indicates asymmetric aberration, astigmatism. C 0 and C 1 can be defined as Fig.…”

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

“…However, in our system, the cover-layer thickness is so thick, 120 lm for the first layer and 130 lm for the second layer, that the interface between the cover-layer and the Si disk is not the applicable object of multiple beam interference theory. In this analysis, we partially follow the mathematical expression represented by Jo et al (2002). Figure 10 represents the configuration of a threelayer system which is composed of the HMS, air, and a cover-layer.…”

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

See 2 more Smart Citations

Design of near-field recording optics using truncated hemispherical SIL with cover-layer incident dual recording layers

et al. 2006

View full text Add to dashboard Cite

In this paper, we propose a novel optics design for media inside near-field recording (NFR) using a truncated hemispherical solid immersion lens (HMS). To obtain strong advantage of data protection and high data capacity simultaneously, a truncated HMS based near field optics with cover-layer incident dual recording layers is designed. In this design, to improve the small optical tolerance of the truncated HMS unit and to adjust dual focusing positions, an additional aspheric lens surface is added on top of the truncated HMS and it is combined with zoom optics composed of two single lenses having a low numerical aperture (NA). Also, to compensate for chromatic aberration, which is a serious problem for optics using a blue laser diode, a diffractive optical element is also designed. Using zoom optics, an additional aspheric lens surface, and a diffractive optical element together, the wavefront aberration and chromatic aberration are effectively reduced in a broad range of cover-layer thicknesses and wavelength variations. In addition, in this paper, the effect of a gap induced aberration is investigated by analyzing the different behavior of each TM and TE wave for the cover-layer incident NFR optics.

show abstract

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

Section: Effect Of Gap Induced Aberration In Dual Layer Nfr Opticsmentioning

confidence: 99%

See 1 more Smart Citation

Design of near-field recording optics using truncated hemispherical SIL with cover-layer incident dual recording layers

et al. 2006

View full text Add to dashboard Cite

show abstract

“…25,26 Instead of the highindex glass used in previous experiments, which has a refractive index of 1.9, ZnS and other optical materials can be examined as SIL candidates for lithography. ZnS has a refractive index of 2.5 at = 405 nm, which is a commerciallyavailable laser diode wavelength.…”

Section: The Proposed Approach For Lithographic Systemsmentioning

confidence: 99%

Maskless lithography with the solid immersion lens nanoprobes

et al. 2004

View full text Add to dashboard Cite

The International Technology Roadmap for Semiconductors (ITRS) shows that 45 nm and lower feature sizes are required in lithographic production before the year 2007. Both immersion lithography and EUV lithography can play major roles in realizing this goal. However, a maskless lithography system capable of producing 45 nm features is an attractive option for small-volume semiconductor fabrication, such as with ASIC manufactures. Compared with a conventional lithography system, the maskless feature of the system allows the chip designer to be free of the very expensive process of mask fabrication and to shortcut development time. In this paper, we discuss a new maskless lithography concept employing an array of solid immersion lens (SIL) nano-probes. The nano-probes are efficient nearfield transducers. Each transducer is the combination a SIL, a dielectric probe tip and an antenna structure. The nanoprobes are fabricated in arrays that dramatically improve throughput. By combining these technologies, it should be possible to fabricate an efficient array of near-field transducers with optical spot dimensions of around 20 nm when illuminated by a 405 nm laser diode source. This paper plans to address, for the first time, the efficient generation of an array of light spots with dimensions of /20 or less that couple efficiently into dielectric films, like photoresist.

show abstract

“…Importantly, such a focal field has an extensively enhanced longitudinal component, for which conceptual interests such as transverse SAM [152][153][154] and Möbius trip [155] have been reported. According to such two typical features of tightly focused vector beams, considerable tightly focused fields with specific intensity, polarization, phase structure, as well as energy flow distribution, by means of amplitude and phase modulations in the pupil plane, [13,[156][157][158][159] have been proposed toward promising applications such as super-resolution imaging, optical trapping, and machining.…”

Section: D Vector Focal Fieldsmentioning

confidence: 99%

Three-dimensional modulations on the states of polarization of light fields

Liu

Zhang

et al. 2018

Chinese Phys. B

View full text Add to dashboard Cite

Light fields with spatially structured states of polarization (SoPs) are gathering increasing attention because of their potential applications from optical imaging and micromanipulation to classical and quantum communications. Meanwhile, the concepts within structured light fields have been extended and applied to acoustic, electron, and matter waves. In this article, we review recent developments of the SoP modulation of light fields, especially focusing on three-dimensional (3D) modulations on the SoPs of light fields. The recent progress and novel implementations based on 3D spin-dependent separation are discussed. Following the discussions to this physical phenomenon, we then describe recent developments on the vector fields with 3D structured SoP and intensity distributions, namely, 3D vector fields. The discussed phenomena inspire us to explore other structured light fields for the expansion of applications in biomedical, information science, quantum optics, and so on.

show abstract

Phase and amplitude apodization induced by focusing through an evanescent gap in a solid immersion lens microscope

Cited by 13 publications

References 6 publications

Design of near-field recording optics using truncated hemispherical SIL with cover-layer incident dual recording layers

Design of near-field recording optics using truncated hemispherical SIL with cover-layer incident dual recording layers

Maskless lithography with the solid immersion lens nanoprobes

Three-dimensional modulations on the states of polarization of light fields

Contact Info

Product

Resources

About